Tailoring of optical properties of alumina films deposited by high vacuum CVD (HV-CVD)

ECS Transactions

Volumn 25, Issue 8 PART 2, 2009, Pages 1093-1098

  Multone, Xavier ^a   Afra, Bamdad ^a   Kuzminykh, Yury ^a   Hoffmann, Patrik ^a,b  

^a EPFL   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA FILMS; AMORPHOUS ALUMINA; DEPOSITION CONDITIONS; HIGH DEPOSITION RATES; HIGH VACUUM; OH GROUP;

ALUMINA; AMORPHOUS FILMS; REFRACTIVE INDEX; STOICHIOMETRY;

CHEMICAL VAPOR DEPOSITION;

EID: 76549130708     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3207711     Document Type: Conference Paper

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