Combinatorial chemical vapor deposition of lithium niobate thin films

ECS Transactions

Volumn 25, Issue 8 PART 2, 2009, Pages 1221-1228

  Dabirian, Ali ^a   Kuzminykh, Yury ^a   Sandu, Silviu Cosmin ^b   Wagner, Estelle ^b   Benvenuti, Giacomo ^b   Parsons, Catherine ^c   Rushworth, Simon ^c   Hoffmann, Patrik ^a,d  

^a EPFL   (Switzerland)

^b ABCD Technology Sarl   (Switzerland)

^c SAFC Hitech   (United Kingdom)

^d SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CONDITIONS; DIFFERENT PRECURSORS; FILM PROPERTIES; HIGH VACUUM; LITHIUM NIOBATE; LITHIUM NIOBATE THIN FILMS; NOVEL PRECURSORS; OXIDIZED SILICON; POLYCRYSTALLINE; SPATIAL CONTROL; SUBSTRATE TEMPERATURE;

DEPOSITION; LITHIUM; NIOBIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS;

CHEMICAL VAPOR DEPOSITION;

EID: 76549097428     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3207727     Document Type: Conference Paper

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