High uniformity deposition with chemical beams in high vacuum

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 411-416

  Benvenuti, G ^a   Halary Wagner, E ^a   Brioude, A ^a   Hoffmann, P ^a  

^a EPFL   (Switzerland)

Author keywords

Compact reactor; Large area deposition; Light assisted deposition; Molecular beams; Uniform thickness

Indexed keywords

DEPOSITION; LIGHT ABSORPTION; MOLECULAR BEAM EPITAXY; SUBSTRATES; THERMAL EFFECTS; THICKNESS CONTROL; TITANIUM DIOXIDE;

GAS SOURCE MOLECULAR BEAM EPITAXY (GSMBE);

THIN FILMS;

EID: 0037416580     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01190-2     Document Type: Article

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