Combinatorial high-vacuum chemical vapor deposition of textured hafnium-doped lithium niobate thin films on sapphire

Crystal Growth and Design

Volumn 11, Issue 1, 2011, Pages 203-209

  Dabirian, Ali ^a   Kuzminykh, Yury ^a,b   Sandu, Silviu Cosmin ^a   Harada, Scott ^a   Wagner, Estelle ^c   Brodard, Pierre ^b   Benvenuti, Giacomo ^c   Rushworth, Simon ^d   Muralt, Paul ^a   Hoffmann, Patrik ^a,b  

^a EPFL   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^c ABCD Technology Sarl   (Switzerland)

^d SAFC Hitech   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

HAFNIUM-DOPED LITHIUM NIOBATE; HIGH VACUUM; IN-PLANE ORIENTATION; LITHIUM CONTENT; LITHIUM NIOBATE; OXIDATION STATE; PRECURSOR FLUX; SINGLE PHASE; TEM; TEXTURED FILMS; XPS DATA;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; HAFNIUM; NIOBIUM; NIOBIUM COMPOUNDS; RAMAN SPECTROSCOPY; SAPPHIRE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VACUUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

LITHIUM;

EID: 78651086265     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg1011583     Document Type: Article

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