Combinatorial chemical beam epitaxy of lithium niobate thin films on sapphire

Journal of the Electrochemical Society

Volumn 158, Issue 2, 2011, Pages

  Dabirian, Ali ^a,e   Harada, Scott ^a   Kuzminykh, Yury ^a,c   Sandu, Silviu Cosmin ^a   Wagner, Estelle ^b   Benvenuti, Giacomo ^b   Brodard, Pierre ^c   Rushworth, Simon ^d   Muralt, Paul ^a   Hoffmann, Patrik ^a,c  

^a EPFL   (Switzerland)

^b ABCD Technology Sarl   (Switzerland)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^d SAFC Hitech   (United Kingdom)

^e DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ETHOXIDES; HIGH DENSITY; LITHIUM CONTENT; LITHIUM NIOBATE; LITHIUM NIOBATE THIN FILMS; ROCKING CURVES; SAPPHIRE SUBSTRATES;

CHEMICAL BEAM EPITAXY; DEPOSITION; EPITAXIAL GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NIOBIUM; NIOBIUM COMPOUNDS; RAMAN SPECTROSCOPY; SAPPHIRE; THIN FILMS; VAPOR DEPOSITION;

LITHIUM;

EID: 78650731668     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3519843     Document Type: Article

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