120 nm resolution and 55 nm structure size in STED-lithography

Optics Express

Volumn 21, Issue 9, 2013, Pages 10831-10840

  Wollhofen, Richard ^a   Katzmann, Julia ^b,c   Hrelescu, Calin ^a   Jacak, Jaroslaw ^a   Klar, Thomas A ^a,b  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^c FRAUNHOFER INSTITUTE FOR NON DESTRUCTIVE TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

STIMULATED EMISSION;

DIRECT LASER WRITING; LATERAL STRUCTURES; NM RESOLUTION; STIMULATED EMISSION DEPLETION; STRUCTURE SIZES; TWO PHOTON; VISIBLE LIGHT;

PHOTONS;

ARTICLE; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; LASER; METHODOLOGY; MOLECULAR IMPRINTING; PHOTOGRAPHY; REFRACTOMETRY; DEVICE FAILURE ANALYSIS; DEVICES; PROCEDURES;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LASERS; MOLECULAR IMPRINTING; PHOTOGRAPHY; REFRACTOMETRY;

EID: 84878610402     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.010831     Document Type: Article

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