Fluorescent two-photon nanolithography

Journal of Microscopy

Volumn 229, Issue 3, 2008, Pages 540-544

  Kunik, D ^a   Luduena S J ^a   Costantino, S ^b   Martinez O E ^a  

^a UNIVERSIDAD DE BUENOS AIRES   (Argentina)

^b MCGILL UNIVERSITY   (Canada)

Author keywords

Lithography; Nanolithography; Two photon absorption

Indexed keywords

ATOMIC FORCE MICROSCOPY; FLUORESCENCE; LASER BEAMS; NANOLITHOGRAPHY; PHOTOPOLYMERIZATION; TWO PHOTON PROCESSES;

EXCITATION CONDITIONS; EXPERIMENTAL EVIDENCE; FABRICATED STRUCTURES; NANOMETRES; ORDERS OF MAGNITUDE; PHOTO POLYMERIZATION; PRECISE CONTROL; SCANNING SPEED; TWO PHOTON; TWO PHOTON ABSORPTION;

PHOTONS;

POLYMER;

ARTICLE; ATOMIC FORCE MICROSCOPY; FLUORESCENCE; IMAGE RECONSTRUCTION; NANOTECHNOLOGY; PHOTON; POLYMERIZATION; PRIORITY JOURNAL;

EID: 40549107096     PISSN: 00222720     EISSN: 13652818     Source Type: Journal    
DOI: 10.1111/j.1365-2818.2008.01940.x     Document Type: Article

References (13)