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Laser and Photonics Reviews

Volumn 7, Issue 1, 2013, Pages 22-44

Three-dimensional optical laser lithography beyond the diffraction limit

(2) Fischer, Joachim a Wegener, Martin a

a KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

Author keywords

Direct laser writing; Optical lithography; Photoresist; Stimulated emission; Superresolution

Indexed keywords

BASIC PRINCIPLES; DEPLETION MECHANISM; DIFFRACTION BARRIER; DIFFRACTION LIMITS; DIRECT LASER WRITING; FAR-FIELD; FAR-FIELD FLUORESCENCE MICROSCOPY; LASER SOURCES; OPTICAL LASERS; POLYMER STRUCTURE; SPARROW CRITERION; SPATIAL RESOLUTION; STIMULATED EMISSION DEPLETION; SUPER RESOLUTION; THREE-DIMENSIONAL STRUCTURE; TWO PHOTON; VISIBLE LIGHT;

ELECTRON BEAM LITHOGRAPHY; FLUORESCENCE MICROSCOPY; LASERS; OPTICAL MICROSCOPY; PHOTOLITHOGRAPHY; PHOTORESISTS; STIMULATED EMISSION; THREE DIMENSIONAL;

DIFFRACTION;

EID: 84872954518 PISSN: 18638880 EISSN: 18638899 Source Type: Journal
DOI: 10.1002/lpor.201100046 Document Type: Review

Times cited : (607)

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