The materials challenge in diffraction-unlimited dired-laser-writing optical lithography

Advanced Materials

Volumn 22, Issue 32, 2010, Pages 3578-3582

  Fischer, Joachim ^a   Von Freymann, Georg ^a,b   Wegener, Martin ^a,b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS WAVES; OPTICAL LITHOGRAPHY; STIMULATED EMISSION DEPLETION; THIOXANTHONES; TWO-COLOR; TWO-PHOTON ABSORPTIONS; TWO-PHOTON EXCITATIONS;

PHOTORESISTS; TWO PHOTON PROCESSES;

PHOTONS;

ALCOHOL; GLASS; ISOPROPYL THIOXANTHONE; XANTHONE DERIVATIVE;

ARTICLE; CHEMISTRY; LASER; SPECTROFLUOROMETRY; SPECTROPHOTOMETRY;

ETHANOL; GLASS; LASERS; SPECTROMETRY, FLUORESCENCE; SPECTROPHOTOMETRY; XANTHONES;

EID: 77955739097     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201000892     Document Type: Article

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