High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization

Optics Express

Volumn 19, Issue 20, 2011, Pages 19486-19494

  Cao, Yaoyu ^a   Gan, Zongsong ^a   Jia, Baohua ^a   Evans, Richard A ^b   Gu, Min ^a  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

^b CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHT SENSITIVE MATERIALS; OPTICAL RESOLVING POWER; PHENOLS; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY;

DIMETHACRYLATES; DIRECT LASER WRITING; EXPOSURE-TIME; FABRICATION TECHNIQUE; FAST CURING; FEATURE SIZES; KINETIC MODELS; SIMULATION-BASED; SUB-50 NM; SUPER RESOLUTION;

POLYMERIZATION;

NANOCOMPOSITE; POLYMER; RESIN;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; INSTRUMENTATION; LASER; MATERIALS TESTING; OPTICAL INSTRUMENTATION; PHOTON; POLYMERIZATION; RADIATION EXPOSURE;

COMPOSITE RESINS; EQUIPMENT DESIGN; LASERS; MATERIALS TESTING; NANOCOMPOSITES; OPTICAL DEVICES; PHOTONS; POLYMERIZATION; POLYMERS;

EID: 80053231210     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.019486     Document Type: Article

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