Two-color single-photon photoinitiation and photoinhibition for subdiffraction photolithography

Science

Volumn 324, Issue 5929, 2009, Pages 913-917

  Scott, Timothy F ^a   Kowalski, Benjamin A ^b   Sullivan, Amy C ^b,c   Bowman, Christopher N ^a   McLeod, Robert R ^b  

^a UCB 450   (United States)

^b UNIVERSITY OF COLORADO   (United States)

^c AGNES SCOTT COLLEGE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MONOMER; MACROGOL DERIVATIVE; POLYMETHACRYLIC ACID DERIVATIVE; TRIETHYLENE GLYCOL DIMETHACRYLATE;

COLOR; INHIBITION; IRRADIATION; POLYMERIZATION;

ARTICLE; GELATION; IMAGE ANALYSIS; IRRADIATION; LIGHT ABSORPTION; NANOFABRICATION; PHOTOLYSIS; PHOTOMETRY; POLYMERIZATION; PRIORITY JOURNAL; SPECTRAL SENSITIVITY; SUBDIFFRACTION PHOTOLITHOGRAPHY; THREE DIMENSIONAL IMAGING; CHEMISTRY; COLOR; LASER; METHODOLOGY; NANOTECHNOLOGY; OPTICS; PHOTOCHEMISTRY; PHOTON;

COLOR; LASERS; NANOTECHNOLOGY; OPTICS AND PHOTONICS; PHOTOCHEMICAL PROCESSES; PHOTONS; POLYETHYLENE GLYCOLS; POLYMETHACRYLIC ACIDS;

EID: 66149083696     PISSN: 00368075     EISSN: 10959203     Source Type: Journal    
DOI: 10.1126/science.1167610     Document Type: Article

References (20)

1. A. C. Sullivan, M. W. Grabowski, R. R. McLeod, Appl. Opt. 46, 295 (2007).
2. S. Kawata, H.-B. Sun, T. Tanaka, K. Takada, Nature 412, 697 (2001).
3. B. H. Cumpston et al., Nature 398, 51 (1999).
4. H.-B. Sun et al., Opt. Lett. 25, 1110 (2000).
5. T. Tanaka, H.-B. Sun, S. Kawata, Appl. Phys. Lett. 80, 312 (2002).
6. W. Haske et al., Opt. Express 15, 3426 (2007).
7. N. C. Strandwitz et al., J. Am. Chem. Soc 130, 8280 (2008).
8. K. Ichimura, M. Sakuragi, J. Polym. Sci. Polym. Lett. Ed. 26, 185 (1988).
9. S.-K. Lee, D. C. Neckers, Chem. Mater. 3, 852 (1991).
10. S.-K. Lee, D. C. Neckers, Chem. Mater. 3, 858 (1991).
11. D. J. Lougnot, D. Ritzenthaler, C. Carre, J. P. Fouassier, J. Appl. Phys. 63, 4841 (1988).
12. S. K. Soh, D. C. Sundberg, J. Polym. Sci. Polym. Chem. Ed. 20, 1299 (1982).
13. G. Donnert et al., Proc. Natl. Acad. Sci. U.S.A. 103, 11440 (2006).
14. Materials and methods and a study examining the effect of exposure time on polymerized feature size are detailed in supporting material available on Science Online.
15. P. J. Flory, in Principles of Polymer Chemistry (Cornell Univ. Press, Ithaca, NY, 1953).
16. L. G. Lovell, B. J. Elliott, J. R. Brown, C. N. Bowman, Polymer 42, 421 (2001).
17. F. Chambon, H. H. Winter, J. Rheol. 31, 683 (1987).
18. H. B. Sun, S. Kawata, in NMR - 3D Analysis - Photopolymerization (Springer, Berlin, 2004), vol. 170, pp. 169-273.
19. J. Arlt, M. J. Padgett, Opt. Lett. 25, 191 (2000).
20. Supported by NSF programs IIP-0750506, IIP-0822695, and ECS-0636650, NIH grant DE10959, and the University of Colorado Innovative Seed Grant Program. A preliminary patent based on this technology has been filed by T.F.S., A.C.S., C.N.B., and R.R.M.