Two-photon lithography of nanorods in SU-8 photoresist

Nanotechnology

Volumn 16, Issue 6, 2005, Pages 846-849

  Juodkazis, Saulius ^a   Mizeikis, Vygantas ^a   Seet, Kock Khuen ^a   Miwa, Masafumi ^b   Misawa, Hiroaki ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

^b WAKAYAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; GLASS; LASER PULSES; LIGHT ABSORPTION; LIGHT PROPAGATION; NANOSTRUCTURED MATERIALS; PHOTONS; PHOTOPOLYMERIZATION; PHOTORESISTS; PIEZOELECTRIC TRANSDUCERS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY;

NANORODS; PHOTONIC CRYSTALS; SU-8 PHOTORESIST; TWO-PHOTON LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 18744370446     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/6/039     Document Type: Article

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