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ChemPhysChem

Volumn 13, Issue 6, 2012, Pages 1429-1434

Photopolymerization inhibition dynamics for sub-diffraction direct laser writing lithography

(4) Harke, Benjamin a Bianchini, Paolo a Brandi, Fernando a Diaspro, Alberto a,b

a ISTITUTO ITALIANO DI TECNOLOGIA (Italy)

b UNIVERSITY OF GENOA (Italy)

Author keywords

lithography; polymerization; resolution; sub diffraction; triplet state

Indexed keywords

DIFFRACTION; OPTICAL RESOLVING POWER; PHOTOPOLYMERIZATION; POLYMERIZATION; STIMULATED EMISSION;

DIRECT LASER WRITING; DIRECT WRITING; FEATURE SIZES; INHIBITION PROCESS; SELECTIVE INHIBITION; STIMULATED EMISSION DEPLETION MICROSCOPY; SUB-DIFFRACTION; TRIPLET STATE;

LITHOGRAPHY;

EID: 84859907618 PISSN: 14394235 EISSN: 14397641 Source Type: Journal
DOI: 10.1002/cphc.201200006 Document Type: Article

Times cited : (47)

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