Sputter deposition of transition-metal carbide films - A critical review from a chemical perspective

Thin Solid Films

Volumn 536, Issue , 2013, Pages 1-24

  Jansson, Ulf ^a   Lewin, Erik ^a,b  

^a UPPSALA UNIVERSITY   (Sweden)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Amorphous films; Chemical stability; Crystal structure; Nanocomposite; Sputtering; Transition metal carbide

Indexed keywords

CHEMICAL AFFINITIES; DEPOSITION TEMPERATURES; INTERPRETATION OF DATA; MATERIALS CHARACTERISATION; PHYSICAL AND CHEMICAL PROPERTIES; SPECIFIC PROPERTIES; STRUCTURE AND PROPERTIES; TRANSITION-METAL CARBIDES;

ALLOYING; ALLOYING ELEMENTS; AMORPHOUS CARBON; AMORPHOUS FILMS; CHEMICAL PROPERTIES; CHEMICAL STABILITY; CRYSTAL STRUCTURE; DEPOSITS; NANOCOMPOSITES; SPUTTER DEPOSITION; SPUTTERING; SURFACE ANALYSIS; TRANSITION METALS;

CARBIDES;

EID: 84877699037     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.02.019     Document Type: Review

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