Structure of sputtered nanocomposite CrCx/a-C:H thin films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 4, 2006, Pages 1837-1843

  Gassner, G ^a   Patscheider, J ^b   Mayrhofer, P H ^a,c   Hegedus, E ^d   Toth L ^d   Kovacs, I ^d   Pecz B ^d   Srot, V ^e   Scheu, Ch ^a   Mitterer, C ^a,f  

^a UNIVERSITY OF LEOBEN   (Austria)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^c RWTH AACHEN UNIVERSITY   (Germany)

^d RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^e MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^f MATERIALS CENTER LEOBEN FORSCHUNG GMBH   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHROMIUM COMPOUNDS; GLOW DISCHARGES; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHASE COMPOSITION; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELASTIC RECOIL DETECTION ANALYSIS; ELECTRON ENERGY LOSS SPECTROSCOPY ANALYSIS; SPUTTERED NANOCOMPOSITES; UNBALANCED MAGNETRON SPUTTERING;

THIN FILMS;

EID: 33746646031     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2216713     Document Type: Article

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