Effects of residual stress on the mechanical and structural properties of TiC thin films grown by RF sputtering

Surface and Coatings Technology

Volumn 194, Issue 2-3, 2005, Pages 190-195

  Mani, Abderahim ^a   Aubert, Pascal ^a   Mercier, Florence ^a   Khodja, Hicham ^b   Berthier, Claire ^c   Houdy, Philippe ^a  

^a UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

^b DIF   (France)

^c CEA SACLAY   (France)

Author keywords

Nanoindentation; RBS; RF sputtering; Thin films; TiC; Titanium carbide; X ray diffraction; XPS

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; HARDNESS; INDENTATION; RESIDUAL STRESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPUTTERING; SUBSTRATES; TITANIUM CARBIDE; X RAY DIFFRACTION ANALYSIS;

NANOINDENTATION; SPUTTERING PRESSURE;

THIN FILMS;

TITANIUM CARBIDE;

EID: 13844289183     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.06.017     Document Type: Article

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