Influence of sputter damage on the XPS analysis of metastable nanocomposite coatings

Surface and Coatings Technology

Volumn 204, Issue 4, 2009, Pages 455-462

  Lewin, Erik ^a   Gorgoi, Mihaela ^b   Schäfers, Franz ^b   Svensson, Svante ^a   Jansson, Ulf ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Metastable phases; Nanocomposite; Sputtering; Sputtering artifacts; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ACCURATE ANALYSIS; ADDITIONAL SAMPLES; C-SYSTEMS; CHEMICAL BONDINGS; COATING STABILITY; IN-DEPTH ANALYSIS; ION ENERGIES; NANO-COMPOSITE COATING; SPUTTER DAMAGE; SPUTTER ETCHING; STANDARD METHOD; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); XPS; XPS ANALYSIS;

CHEMICAL BONDS; COATINGS; ETCHING; METASTABLE PHASES; NANOCOMPOSITES; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; PLATINUM; SPECTRUM ANALYSIS; TITANIUM CARBIDE; X RAY ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70349145758     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.08.006     Document Type: Article

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