Magnetron sputtering of Zr-Si-C thin films

Thin Solid Films

Volumn 520, Issue 20, 2012, Pages 6375-6381

  Andersson, Matilda ^a   Urbonaite, Sigita ^a   Lewin, Erik ^a,b   Jansson, Ulf ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Amorphous materials; Carbides; Physical vapor deposition; Sputtering; Thin films; Transmission electron microscopy; X ray diffraction; X ray photoelectron spectroscopy; Zr Si C

Indexed keywords

AMORPHOUS CARBON MATRIX; CARBON CONTENT; CHEMICAL BONDINGS; CRITICAL CONCENTRATION; ELECTRICAL AND MECHANICAL PROPERTIES; SI-C BOND; THERMALLY STABLE; ZR-SI-C;

AMORPHOUS CARBON; AMORPHOUS MATERIALS; AMORPHOUS SILICON; CARBIDES; CARBON FILMS; CHEMICAL BONDS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; NANOCRYSTALLITES; PHOTOELECTRONS; PHYSICAL VAPOR DEPOSITION; SILICON; SILICON CARBIDE; SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM; ZIRCONIUM COMPOUNDS;

AMORPHOUS FILMS;

EID: 84863987627     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.06.044     Document Type: Article

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