Structure and characteristics of amorphous (Ti,Si)-C:H films deposited by reactive magnetron sputtering

Diamond and Related Materials

Volumn 19, Issue 10, 2010, Pages 1172-1177

  Jiang, Jinlong ^a,b,c   Hao, Junying ^a   Pang, Xianjuan ^a,b   Wang, Peng ^a   Liu, Weimin ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b LANZHOU UNIVERSITY OF TECHNOLOGY   (China)

^c UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Amorphous hydrogenated carbon; Doping; Microstructure; Superlow friction

Indexed keywords

AMBIENT AIR; AMORPHOUS HYDROGENATED CARBON; ATOMIC FORCE MICROSCOPES; COMPOSITE TARGET; DOPING; FRICTION COEFFICIENTS; FRICTION PROCESS; HYDROGENATED AMORPHOUS CARBON FILMS; METHANE GAS; RATE INCREASE; REACTIVE MAGNETRON SPUTTERING; RELATIVE HUMIDITIES; SI CONTENT; SILICON SUBSTRATES; SUPERLOW FRICTION; SYNERGISTIC EFFECT; TRIBOMETERS; VISIBLE RAMAN SPECTROSCOPY;

AMORPHOUS CARBON; AMORPHOUS FILMS; ARGON; ATMOSPHERIC HUMIDITY; CARBON FILMS; DOPING (ADDITIVES); FRICTION; HYDROGENATION; METHANE; MICROSTRUCTURE; RAMAN SPECTROSCOPY; TRIBOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SILICON;

EID: 77956062218     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.05.005     Document Type: Article

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