High-rate deposition of amorphous and nanocomposite Ti-Si-C multifunctional coatings

Surface and Coatings Technology

Volumn 205, Issue 2, 2010, Pages 299-305

  Lauridsen, J ^a   Eklund, P ^a   Joelsson, T ^b   Ljungcrantz, H ^b   Oberg A ^c   Lewin, E ^d   Jansson, U ^d   Beckers, M ^a   Hogberg H ^a   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b Impact Coatings AB   (Sweden)

^c ABB CORPORATE RESEARCH   (Sweden)

^d UPPSALA UNIVERSITY   (Sweden)

Author keywords

Electron microscopy; Magnetron sputtering; Nanocomposites; Pilot plant; Resistivity; TiSiC coatings

Indexed keywords

BALLISTIC TRANSPORTS; COATING MICROSTRUCTURES; CONTACT FORCES; DIRECT CURRENT MAGNETRON SPUTTERING; ELASTIC RECOIL DETECTION ANALYSIS; ELECTRICAL RESISTIVITY; GASPHASE; HIGH-RATE DEPOSITION; HIGH-SPEED STEELS; MATRIX; MULTIFUNCTIONAL COATINGS; NANO-INDENTATION HARDNESS; NANOCRYSTALLINES; PLANT SYSTEMS; RE-SPUTTERING; RESISTIVITY; SCATTERING PROPERTY; SHEATH THICKNESS; SPUTTERED SPECIES; SUBSTRATE CONDITIONS; SUBSTRATE DISTANCE; TISIC COATINGS;

AMORPHOUS SILICON; BALLISTICS; COATINGS; ELECTRIC CONDUCTIVITY; ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; NANOCOMPOSITES; NANOINDENTATION; PILOT PLANTS; PLASMA DEPOSITION; PLASMA SHEATHS; SILICON CARBIDE; TITANIUM; TITANIUM CARBIDE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATES;

EID: 77956449357     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.06.051     Document Type: Article

References (54)

1. Chen Z.-K. IEEE Trans. Comp. Hybrids Manuf. Technol. 1992, 15(3):378.
2. Tian H., Saka N., Rabinowicz E. Wear 1991, 142:57.
3. Antler M. Thin Solid Films 1981, 84:245.
4. Chen Z.-K. Wear 1992, 155:353.
5. Jansson U., Lewin E., Råsander M., Eriksson O., André B., Wiklund U. Surf. Coat. Technol. 2010, 10.1016/j.surfcoat.2010.06.017.
6. Feng B., Cao D.M., Meng W.J., Xu J., Tittsworth R.C., Rehn L.E., Baldo P.M., Doll G.L. Surf. Coat. Technol. 2001, 148:153.
7. Martinez-Martinez D., Lopez-Cartes C., Justo A., Fernández A., Sánchez-López J.C., Garcia-Luis A., Brizuela M., Onate J.I. J. Vac. Sci. Technol. A 2005, 23:1732.
8. Pei Y.T., Galvan D., DeHosson J.Th.M., Cavalerio A. Surf. Coat. Technol. 2005, 198:44.
9. Zehnder T., Matthey J., Schwaller P., Klein A., Steinmann P.-A., Patscheider J. Surf. Coat. Technol. 2003, 163-164:238.
10. Phani A.R., Krzanowski J.E., Nainaparampil J.J. J. Vac. Sci. Technol. A 2001, 19:2252.
11. Eklund P., Emmerlich J., Högberg H., Wilhelmsson O., Isberg P., Birch J., Persson P.O.Å., Jansson U., Hultman L. J. Vac. Sci. Technol. B 2005, 23:2486.
12. Lewin E., Wilhelmsson O., Jansson U. J. Appl. Phys. 2006, 100:054303.
13. Eklund P., Joelsson T., Ljungcrantz H., Wilhelmsson O., Czigány Zs., Högberg H., Hultman L. Surf. Coat. Technol. 2007, 201:6465.
14. P. Isberg, P. Eklund, J. Emmerlich, L. Hultman, H. Högberg, H. Ljungcrantz, International Patent no. WO2005/038985 A2 (18 October 2004).
15. Eklund P. Surf. Eng. 2007, 23:406.
16. Rester M., Neidhardt J., Eklund P., Emmerlich J., Ljungcrantz H., Hultman L., Mitterer C. Mater. Sci. Eng. A 2006, 429:90.
17. Lopes C., Parreira N.M.G., Carvalho S., Cavaleiro A., Rivière J.P., Le Bourhis E., Vaz F. Surf. Coat. Technol. 2007, 201:7180.
18. Munteanu D., Ionescu C., Olteanu C., Munteanu A., Davin F., Cunha L., Moura C., Vaz F. Wear 2010, 268:552.
19. Krzanowski J.E., Koutzaki S.H. J. Am. Ceram. Soc. 2001, 84:672.
20. Gulbinski W., Gilewicz A., Suszko T., Warcholinski B., Kuklinski Z. Surf. Coat. Technol. 2004, 180:341.
21. Koutzaki S.H., Krzanowski J.E., Nainaparampril J.J. J. Vac. Sci. Technol. A 2001, 19(4):1912.
22. Zhang Y., Whitlow H.J., Winzell T., Bubb I.F., Sajavaara T., Jokinen J., Arstila K., Keinonen J. Nucl. Instrum. Meth. Phys. Res. B 1999, 149:477.
23. Janson M.S. CONTES Instruction Manual 2004.
24. Seah M.P. Surf. Interface Anal. 2001, 31:721.
25. Oliver W.C., Pharr G.M. J. Mater. Res. 1992, 7:1564.
26. Pierson H.O. Handbook of Refractory Carbides and Nitrides 1996, Noyes Publication.
27. Eklund P., Beckers M., Frodelius J., Högberg H., Hultman L. J. Vac. Sci. Technol. A 2007, 25(5):1381.
28. Eklund P., Beckers M., Jansson U., Högberg H., Hultman L. Thin Solid Films 2010, 518:1851.
29. Roth A. Vacuum Technology 1982, North-Holland, equation 2.57.
30. Yamamura Y., Tawara H. At. Data Nucl. Data Tables 1996, 62:149.
31. Chapman B. Glow Discharge Processes - Sputtering and Plasma Etching 1980, John Wiley & Sons.
32. Alami J., Eklund P., Emmerlich J., Wilhelmsson O., Jansson U., Högberg H., Hultman L., Helmersson U. Thin Solid Films 2006, 515:1731.
33. Chastain J., King R. Handbook of X-ray Photoelectron Spectroscopy 1995, Physical Electronics, Eden Prarie, MN.
34. Nainaparampil J.J., Zabinski J.S. J. Vac. Sci. Technol. A 1999, 17:909.
35. Voevodin A.A., Zabinski J.S. J. Mater. Sci. 1998, 33:319.
36. Zhang S., Bui X.L., Jiang J., Li X. Surf. Coat. Technol. 2005, 198:206.
37. Luthin J., Plank H., Roth J., Linsmeier Ch. Nucl. Instrum. Meth. Phys. Res. B 2001, 182:218.
38. Li G., Xia L.F. Thin Solid Films 2001, 396:16.
39. Gulbinski W., Mathur S., Shen H., Suszko T., Gilewice A., Warcholinski B. Appl. Surf. Sci. 2005, 239:302.
40. Lewin E., Olsson E., André B., Joelsson T., Öberg Å., Wiklund U., Ljungcrantz H., Jansson U. Plasma Processes Polym. 2009, 6:S928.
41. Lewin E., Persson P.O.Å., Lattemann M., Stüber M., Gorgoi M., Sandell A., Ziebert C., Schäfers F., Braun W., Halbritter J., Ulrich S., Eberhardt W., Hultman L., Siegbahn H., Svensson S., Jansson U. Surf. Coat. Technol. 2008, 202:3563.
42. Lewin E., Gorgoi M., Schäfers F., Svensson S., Jansson U. Surf. Coat. Technol. 2009, 204:455.
43. Magnuson M., Lewin E., Hultman L., Jansson U. Phys. Rev. B 2009, 80:235108.
44. Stüber M., Leiste H., Ulrich S., Holleck H., Schild D. Surf. Coat. Technol. 2002, 150:218.
45. Pei Y.T., Chen C.Q., Shaha K.P., De Hosson J.Th.M., Bradley J.W., Voronin S.A., Cada M. Acta Mater. 2008, 56:696.
46. Pei Y.T., Shaha K.P., Chen C.Q., van der Hulst R., Turkin A.A., Vainshtein D.I., De Hosson J.Th.M. Acta Mater. 2009, 57:5156.
47. Naka M., Sakai H., Maeda M., Mori H. Mater. Sci. Eng. 1997, A226-228:774.
48. Wilhelmsson O., Eklund P., Högberg H., Hultman L., Jansson U. Acta Mater. 2008, 56:2563.
49. Abe H., Yamamoto S., Naramoto H. Nucl. Instrum. Meth. Phys. Res. B 1997, 127/128:170.
50. Abe H., Naramoto H., Iwase A., Kinoshita C. Nucl. Instrum. Meth. Phys. Res. B 1997, 127/128:681.
51. Santerre F., El Khakani M.A., Chaker M., Dodelet J.P. Appl. Surf. Sci. 1999, 148:24.
52. Emmerlich J., Palmquist J.-P., Högberg H., Molina-Aldareguia J.M., Czigány Zs., Sasvári Sz., Persson P.O.Å., Jansson U., Hultman L. J. Appl. Phys. 2004, 96:4817.
53. Slade P. Electrical Contacts - Principles and Applications 1999, Marcel Dekker, Inc., New York.
54. Högberg H., Birch J., Odén M., Malm J.-O., Hultman L., Jansson U. J. Mater. Res. 2001, 16:1301.