Structure and mechanical properties of DC magnetron sputtered TiC/Cu films

Vacuum

Volumn 81, Issue 4, 2006, Pages 531-538

  Soldan J ^a   Musil, J ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Mechanical properties; Stress; Structure; TiC Cu films

Indexed keywords

ARGON; COPPER; MAGNETRON SPUTTERING; PARAMETER ESTIMATION; SCANNING ELECTRON MICROSCOPY; SINTERING; SPUTTER DEPOSITION; STRESSES; TITANIUM CARBIDE; X RAY DIFFRACTION ANALYSIS;

CARBIDE SYSTEMS; COPPER RING; DEPOSITION PARAMETERS; TOTAL INTERNAL STRESS;

THIN FILMS;

EID: 33750074434     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.07.013     Document Type: Article

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