Mechanical Properties of Sputter-Deposited Titanium-Silicon-Carbon Films

Journal of the American Ceramic Society

Volumn 84, Issue 3, 2001, Pages 672-674

  Krzanowski, James E ^a   Koutzaki, Sirma H ^a  

^a Univ of New Hampshire   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPOSITION EFFECTS; ELASTIC MODULI; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL VARIABLES MEASUREMENT; MICROSTRUCTURE; RESIDUAL STRESSES; SILICON CARBIDE; SILICON WAFERS; TITANIUM CARBIDE; TRANSMISSION ELECTRON MICROSCOPY;

DUAL CATHODE RADIO FREQUENCY MAGNETRON SPUTTERING; HARDNESS MEASUREMENT; NANOINDENTATION HARDNESS; TITANIUM SILICON CARBON FILMS;

THIN FILMS;

EID: 0035297415     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00724.x     Document Type: Article

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