Search for new materials in sputtered V1-xCx films

Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 315-321

  Aouni, A ^a,c   Weisbecker, P ^b   Loi, Tran Huu ^a   Bauer Grosse, E ^a  

^a Universite Paris Dauphine   (France)

^b CNRS   (France)

^c ABDELMALEK ESSAADI UNIVERSITY   (Morocco)

Author keywords

Amorphous materials; Carbides; Crystallization; Physical vapour deposition (pvd)

Indexed keywords

CARBIDES; CRYSTALLIZATION; DEPOSITION; GLASS; MAGNETRON SPUTTERING; MICROANALYSIS; PHASE DIAGRAMS; PHYSICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ATOMIC CARBON CONTENT; ELECTRON PROBE MICROANALYSIS (EPMA); GLASS FORMING ABILITY (GFA); V-C FILMS;

AMORPHOUS FILMS;

EID: 10044284125     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.139     Document Type: Article

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