A route for fabricating printable photonic devices with sub-10 nm resolution

Nanotechnology

Volumn 24, Issue 6, 2013, Pages

  Pina Hernandez, Carlos ^a   Lacatena, Valeria ^b   Calafiore, Giuseppe ^a,b   Dhuey, Scott ^b   Kravtsov, Konstantin ^c   Goltsov, Alexander ^c   Olynick, Deirdre ^b   Yankov, Vladimir ^c   Cabrini, Stefano ^b   Peroz, Christophe ^a  

^a Beam Technologies   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c NanoOptic Devices LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION MATERIAL; CRACK FREE; EXTINCTION COEFFICIENTS; HIGH REFRACTIVE INDEX; HIGH-THROUGHPUT; IMPRINT RESIST; NM RESOLUTION; ORGANIC-INORGANIC; PHOTONIC STRUCTURE; RESIST MATERIALS; THERMAL-ANNEALING; TIO; VISIBLE WAVELENGTHS; VISIBLE-WAVELENGTH RANGE;

NANOPHOTONICS; TITANIUM DIOXIDE;

REFRACTIVE INDEX;

EID: 84872928787     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/6/065301     Document Type: Article

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