SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 31, Issue 1, 2013, Pages

Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography

(3) Ogawa, Tsuyoshi a Takei, Satoshi b Grant Willson, C c

a CENTRAL GLASS CO LTD (Japan)

b TOYAMA PREFECTURAL UNIVERSITY (Japan)

c The University of Texas at Austin (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLENDING; CHEMICAL MECHANICAL POLISHING; CURING; DIELECTRIC MATERIALS; HYDROSTATIC PRESSURE; SILICON; SILICON COMPOUNDS; VAPORS; VISCOSITY;

CYCLIC SILOXANE; DISPENSING SYSTEMS; HIGH RESOLUTION; IMPRINT LITHOGRAPHY; IMPRINT RESIST; LOW DIELECTRIC CONSTANTS; LOW K DIELECTRICS; LOW VAPOR PRESSURES; LOW VISCOSITY; PATTERNED STRUCTURE; STEP AND FLASH IMPRINT LITHOGRAPHY; ULTRAVIOLET CURABLE; UV CURABLE; UV CURE; UV CURED; YOUNG'S MODULUS;

NANOIMPRINT LITHOGRAPHY;

EID: 84872745393 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.4770051 Document Type: Article

Times cited : (16)

References (25)

1
- 0032625408
- 10.1117/12.351155
- M. Colburn, Proc. SPIE 3676, 379 (1999). 10.1117/12.351155
- (1999) Proc. SPIE , vol.3676 , pp. 379
- Colburn, M.¹

2
- 70349283932
- 10.2494/photopolymer.22.147
- C. G. Willson, J. Photopolym. Sci. Technol. 22, 147 (2009). 10.2494/photopolymer.22.147
- (2009) J. Photopolym. Sci. Technol. , vol.22 , pp. 147
- Willson, C.G.¹

3
- 79955902986
- 10.1117/12.882940
- T. Higashiki, T. Nakasugi, and I. Yoneda, Proc. SPIE 7970, 797003 (2011). 10.1117/12.882940
- (2011) Proc. SPIE , vol.7970 , pp. 797003
- Higashiki, T.¹ Nakasugi, T.² Yoneda, I.³

4
- 62649134210
- 10.1117/12.775115
- J. Yeo, H. Kim, and B. Eynon, Proc. SPIE 6921, 692107 (2008). 10.1117/12.775115
- (2008) Proc. SPIE , vol.6921 , pp. 692107
- Yeo, J.¹ Kim, H.² Eynon, B.³

5
- 67149091231
- 10.1117/12.815016
- C. Brooks, G. M. Schmid, M. Miller, S. Johnson, N. Khusnatdinov, D. LaBrake, D. J. Resnick, and S. V. Sreenivasan, Proc. SPIE 7271, 72711L (2009). 10.1117/12.815016
- (2009) Proc. SPIE , vol.7271
- Brooks, C.¹ Schmid, G.M.² Miller, M.³ Johnson, S.⁴ Khusnatdinov, N.⁵ Labrake, D.⁶ Resnick, D.J.⁷ Sreenivasan, S.V.⁸

6
- 77953298999
- 10.1117/12.849226
- Z. Ye, R. Ramos, C. B. Brooks, P. Hellebrekers, S. Carden, and D. LaBrake, Proc. SPIE 7637, 76371 (2010). 10.1117/12.849226
- (2010) Proc. SPIE , vol.7637 , pp. 76371
- Ye, Z.¹ Ramos, R.² Brooks, C.B.³ Hellebrekers, P.⁴ Carden, S.⁵ Labrake, D.⁶

7
- 33646051244
- 10.1117/12.647301
- N. Khusnatdinov, G. Doyle, M. Miller, N. Stacey, M. Watts, and D. L. LaBrake, Proc. SPIE 6110, 61100K (2006). 10.1117/12.647301
- (2006) Proc. SPIE , vol.6110
- Khusnatdinov, N.¹ Doyle, G.² Miller, M.³ Stacey, N.⁴ Watts, M.⁵ Labrake, D.L.⁶

8
- 34248638455
- 10.1117/12.715220
- C. Jones, D. Lentz, G. Doyle, M. Miller, M. Ganapathisubramanian, X. Lu, D. Resnick, and D. L. LaBrake, Proc. SPIE 6486, 64860Q (2007). 10.1117/12.715220
- (2007) Proc. SPIE , vol.6486
- Jones, C.¹ Lentz, D.² Doyle, G.³ Miller, M.⁴ Ganapathisubramanian, M.⁵ Lu, X.⁶ Resnick, D.⁷ Labrake, D.L.⁸

9
- 84872710228
- Sematech, presented at the 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08), Kyoto, Japan, 13-15 October.
- L. Litt, Sematech, presented at the 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08), Kyoto, Japan, 13-15 October 2008.
- (2008)
- Litt, L.¹

10
- 84872715779
- Infineon Technologies, presented at Semicon Europa, Stuttgart, Germany, 9-11 October.
- S. V. Postnikov, Infineon Technologies, presented at Semicon Europa, Stuttgart, Germany, 9-11 October 2007.
- (2007)
- Postnikov, S.V.¹

11
- 33745632075
- 10.1117/12.655604
- F. Palmieri, Proc. SPIE 6151, 61510J (2006). 10.1117/12.655604
- (2006) Proc. SPIE , vol.6151
- Palmieri, F.¹

12
- 24644465507
- 10.1117/12.599977
- M. D. Stewart, Proc. SPIE 5751, 210 (2005). 10.1117/12.599977
- (2005) Proc. SPIE , vol.5751 , pp. 210
- Stewart, M.D.¹

13
- 35148870551
- 10.1117/12.712261
- J. Hao, M. W. Lin, F. Palmieri, Y. Nishimura, H.-L. Chao, M. D. Stewart, A. Collins, K. Jen, and C. G. Willson, Proc. SPIE 6517, 651729 (2007). 10.1117/12.712261
- (2007) Proc. SPIE , vol.6517 , pp. 651729
- Hao, J.¹ Lin, M.W.² Palmieri, F.³ Nishimura, Y.⁴ Chao, H.-L.⁵ Stewart, M.D.⁶ Collins, A.⁷ Jen, K.⁸ Willson, C.G.⁹

14
- 34548090229
- 10.1039/b705388f
- B. K. Long, B. Keith Keitz, and C. G. Willson, J. Mater. Chem. 17, 3575 (2007). 10.1039/b705388f
- (2007) J. Mater. Chem. , vol.17 , pp. 3575
- Long, B.K.¹ Keith Keitz, B.² Willson, C.G.³

15
- 50849104817
- 10.2494/photopolymer.21.563
- F. A. Houle, D. C. Miller, A. Fornof, H. Trung, S. Raoux, R. Sooriyakumaran, H. Ito, and M. Hart, J. Photopolym. Sci. Technol. 21, 563 (2008). 10.2494/photopolymer.21.563
- (2008) J. Photopolym. Sci. Technol. , vol.21 , pp. 563
- Houle, F.A.¹ Miller, D.C.² Fornof, A.³ Trung, H.⁴ Raoux, S.⁵ Sooriyakumaran, R.⁶ Ito, H.⁷ Hart, M.⁸

16
- 67650073741
- 10.1117/1.2896047
- M. W. Lin, B. Chao, J. Hao, K. Osberg, P. S. Ho, and C. G. Willson, J. Micro/Nanolith. MEMS MOEMS 7, 023008 (2008). 10.1117/1.2896047
- (2008) J. Micro/Nanolith. MEMS MOEMS , vol.7 , pp. 023008
- Lin, M.W.¹ Chao, B.² Hao, J.³ Osberg, K.⁴ Ho, P.S.⁵ Willson, C.G.⁶

17
- 77953298860
- 10.1117/12.846430
- T. Ogawa, S. Takei, B. Michael Jacobsson, R. Deschner, W. Bell, M. W. Lin, Y. Hagiwara, M. Hanabata, and C. G. Willson, Proc. SPIE 7637, 763708 (2010). 10.1117/12.846430
- (2010) Proc. SPIE , vol.7637 , pp. 763708
- Ogawa, T.¹ Takei, S.² Michael Jacobsson, B.³ Deschner, R.⁴ Bell, W.⁵ Lin, M.W.⁶ Hagiwara, Y.⁷ Hanabata, M.⁸ Willson, C.G.⁹

18
- 24144432962
- 10.1117/1.1862650
- M. D. Stewart, S. C. Johnson, S. V. Sreenivasan, D. J. Resnick, and C. G. Willson, J. Microlithogr., Microfabr., Microsyst. 4, 011002 (2005). 10.1117/1.1862650
- (2005) J. Microlithogr., Microfabr., Microsyst. , vol.4 , pp. 011002
- Stewart, M.D.¹ Johnson, S.C.² Sreenivasan, S.V.³ Resnick, D.J.⁴ Willson, C.G.⁵

19
- 4344692571
- 10.1016/j.mee.2004.05.010
- M. Colburn, B. J. Choi, S. V. Sreenivasan, R. T. Bonnecaze, and C. G. Willson, Microelectron. Eng. 75, 321 (2004). 10.1016/j.mee.2004.05.010
- (2004) Microelectron. Eng. , vol.75 , pp. 321
- Colburn, M.¹ Choi, B.J.² Sreenivasan, S.V.³ Bonnecaze, R.T.⁴ Willson, C.G.⁵

20
- 3843056766
- 10.1117/12.538734
- F. Xu, Proc. SPIE 5374, 232 (2004). 10.1117/12.538734
- (2004) Proc. SPIE , vol.5374 , pp. 232
- Xu, F.¹

21
- 79955927375
- 10.1117/12.871627
- T. Ogawa, D. J. Hellebusch, M. W. Lin, B. Michael Jacobsson, W. Bell, and C. G. Willson, Proc. SPIE 7970, 79700T (2011). 10.1117/12.871627
- (2011) Proc. SPIE , vol.7970
- Ogawa, T.¹ Hellebusch, D.J.² Lin, M.W.³ Michael Jacobsson, B.⁴ Bell, W.⁵ Willson, C.G.⁶

22
- 22144480278
- 10.2494/photopolymer.18.531
- N. Sakai, J. Taniguchi, K. Kawaguchi, M. Ohtaguchi, and T. Hirasawa, J. Photopolym. Sci. Technol. 18, 531 (2005). 10.2494/photopolymer.18.531
- (2005) J. Photopolym. Sci. Technol. , vol.18 , pp. 531
- Sakai, N.¹ Taniguchi, J.² Kawaguchi, K.³ Ohtaguchi, M.⁴ Hirasawa, T.⁵

23
- 1642302875
- 10.1116/1.1635849
- E. K. Kim, N. A. Stacey, B. J. Smith, M. D. Dickey, S. C. Johnson, B. C. Trinque, and C. G. Willson, J. Vac. Sci. Technol. B 22, 131 (2004). 10.1116/1.1635849
- (2004) J. Vac. Sci. Technol. B , vol.22 , pp. 131
- Kim, E.K.¹ Stacey, N.A.² Smith, B.J.³ Dickey, M.D.⁴ Johnson, S.C.⁵ Trinque, B.C.⁶ Willson, C.G.⁷

24
- 33745600419
- 10.1117/12.656518
- H. Ito, F. A. Houle, M. W. Hart, and R. A. DiPietro, Proc. SPIE 6153, 61531A (2006). 10.1117/12.656518
- (2006) Proc. SPIE , vol.6153
- Ito, H.¹ Houle, F.A.² Hart, M.W.³ Dipietro, R.A.⁴

25
- 33847715985
- 10.1021/nl061217f
- E. C. Hagberg, M. Malkoch, Y. Ling, C. J. Hawker, and K. R. Carter, Nano Lett. 7, 233 (2007). 10.1021/nl061217f
- (2007) Nano Lett. , vol.7 , pp. 233
- Hagberg, E.C.¹ Malkoch, M.² Ling, Y.³ Hawker, C.J.⁴ Carter, K.R.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.