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Volumn 22, Issue 2, 2009, Pages 147-153

A decade of step and flash imprint lithography

Author keywords

BEOL; Nano imprint; Step and flash imprint lithography; Templates

Indexed keywords


EID: 70349283932     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.147     Document Type: Article
Times cited : (42)

References (22)
  • 7
    • 50849134310 scopus 로고    scopus 로고
    • F. Houle, et. al. Proc. SPIE, 6921, (2008) 69210B.
    • (2008) Proc. SPIE , vol.6921
    • Houle, F.1
  • 15
    • 70350163562 scopus 로고    scopus 로고
    • Infineon Technologies; presented at Semicon Europa
    • S. Postnikov, Infineon Technologies; presented at Semicon Europa 2007, Stuttgart, Germany.
    • (2007)
    • Postnikov, S.1
  • 16
    • 70350165694 scopus 로고    scopus 로고
    • Cost Analysis of Nanoimprint Lithography
    • L. Lift, L. C Plenary Paper, Paris, France November 2006
    • L. Lift, L.C., "Cost Analysis of Nanoimprint Lithography". Nanoimprint and Nanoprint Technology, Plenary Paper, Paris, France November 2006.
    • Nanoimprint and Nanoprint Technology


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.