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Journal of Photopolymer Science and Technology

Volumn 21, Issue 4, 2008, Pages 563-572

Nanoimprint materials systems

(8) Houle, F A a Miller, D C a Fornof, A a Truong, H a Raoux, S a Sooriyakumaran, R a Ito, H a Hart, M a

a IBM ALMADEN RESEARCH CENTER (United States)

Author keywords

Fluoroalkyl silanes; Metal nitrides; Metal oxides; Nanoimprint resists; Template release; UV nanoimprint lithography

Indexed keywords

EID: 50849104817 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.21.563 Document Type: Article

Times cited : (13)

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