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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques

(2) Bertrand, Jacob A a George, Steven M a,b

a UNIVERSITY OF COLORADO (United States)

b University of Colorado at Boulder (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATE AGREEMENT; ATOMIC LAYER; CONDUCTANCE MEASUREMENT; ELECTRICAL CONDUCTANCE; FILM OXIDATION; GAS DIFFUSION; PHOTOGRAPHIC IMAGE; PINHOLE DEFECTS; RAPID REDUCTION; TRIMETHYLALUMINUM; WATER CORROSION; WATER VAPOR TRANSMISSION RATE;

ALUMINUM; ATOMIC LAYER DEPOSITION; DEFECTS; DIFFUSION BARRIERS; DIFFUSION IN GASES; ELECTRIC CONDUCTANCE; IMAGE PROCESSING; IMAGING SYSTEMS; OXIDATION; PHOTOGRAPHY;

CALCIUM;

EID: 84871857250 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.4763360 Document Type: Article

Times cited : (40)

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