Reliable thin film encapsulation for organic light emitting diodes grown by low-temperature atomic layer deposition

Applied Physics Letters

Volumn 94, Issue 23, 2009, Pages

  Meyer, J ^a   Schneidenbach, D ^a   Winkler, T ^a   Hamwi, S ^a   Weimann, T ^a   Hinze, P ^a   Ammermann, S ^a   Johannes, H H ^a   Riedl, T ^a   Kowalsky, W ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS OPERATION; DEVICE LIFETIME; HIGHLY DENSE; LOW TEMPERATURES; NANOLAMINATE; ORGANIC ELECTRONIC DEVICES; SUB-LAYERS; THIN FILM ENCAPSULATION;

ATOMS; DIFFUSION BARRIERS; GAS PERMEABLE MEMBRANES; HELMET MOUNTED DISPLAYS; LIGHT EMISSION; LIGHT EMITTING DIODES; LIGHT SOURCES; OZONE WATER TREATMENT; THIN FILM DEVICES; THIN FILMS;

ORGANIC LIGHT EMITTING DIODES (OLED);

EID: 67649126473     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3153123     Document Type: Article

References (18)

1. P. E. Burrows, V. Bulovic, S. R. Forrest, L. S. Sapochack, D. M. McCarty, and M. E. Thompson, Appl. Phys. Lett. 0003-6951 65, 2922 (1994). 10.1063/1.112532
2. J. McElvain, H. Antoniadis, M. R. Hueschen, J. N. Miller, D. M. Roitman, J. R. Sheats, and R. L. Moon, J. Appl. Phys. 0021-8979 80, 6002 (1996). 10.1063/1.363598
3. P. E. Burrows, G. L. Graf, M. E. Gross, P. M. Martin, M. Hall, E. Mast, C. Bonham, W. Bennet, L. Michalski, M. S. Weaver, J. J. Brown, D. Fogarty, and L. S. Sapochack, Proc. SPIE 0277-786X 4105, 75 (2000). 10.1117/12.416878
4. A. B. Chwang, M. A. Rothman, S. Y. Mao, R. H. Hewitt, M. S. Weaver, J. A. Silvernail, K. Rajan, M. Hack, J. J. Brown, X. Chu, L. Moro, T. Krajewski, and N. Rutherford, Appl. Phys. Lett. 0003-6951 83, 413 (2003). 10.1063/1.1594284
5. F. L. Wong, M. K. Fung, S. L. Tao, S. L. Lai, W. M. Tsang, K. H. Kong, W. M. Choy, C. S. Lee, and S. T. Lee, J. Appl. Phys. 0021-8979 104, 014509 (2008). 10.1063/1.2940727
6. G. Rossi and M. Nulman, J. Appl. Phys. 0021-8979 74, 5471 (1993). 10.1063/1.354227
7. A. S. da Silva Sobrinho, M. Latŕche, G. Czeremuszkin, J. E. Klemberg-Sapieha, and M. R. Wertheimer, J. Vac. Sci. Technol. A 0734-2101 16, 3190 (1998). 10.1116/1.581519
8. G. L. Graff, R. E. Williford, and P. E. Burrows, J. Appl. Phys. 0021-8979 96, 1840 (2004). 10.1063/1.1768610
9. C. Charton, N. Schiller, M. Fahland, A. Holländer, A. Wedel, and K. Noller, Thin Solid Films 0040-6090 502, 99 (2006). 10.1016/j.tsf.2005.07.253
10. M. Pessa, R. Mäkelä, and T. Sunola, Appl. Phys. Lett. 0003-6951 38, 131 (1981). 10.1063/1.92274
11. M. D. Groner, F. H. Fabreguette, J. W. Elam, and S. M. George, Chem. Mater. 0897-4756 16, 639 (2004). 10.1021/cm0304546
12. J. Meyer, P. Görrn, F. Bertram, S. Hamwi, T. Winkler, H. -H. Johannes, T. Weimann, P. Hinze, T. Riedl, and W. Kowalsky, Adv. Mater. (Weinheim, Ger.) 0935-9648 21, 1845 (2009). 10.1002/adma.200803440
13. A. A. Dameron, S. D. Davidson, B. B. Burton, P. F. Carcia, R. S. McLean, and S. M. George, J. Phys. Chem. C 1932-7447 112, 4573 (2008). 10.1021/jp076866+
14. D. Schneidenbach, S. Ammermann, M. Debeaux, A. Freund, M. Zöllner, W. Kowalsky, and H. -H. Johannes, Inorg. Chem. 0020-1669 (submitted).
15. C. -Y. Chang, F. -Y. Tsai, S. -J. Jhuo, and M. -J. Che, Org. Electron. 1566-1199 9, 667 (2008). 10.1016/j.orgel.2008.04.009
16. C. F́ry, B. Racine, D. Vaufrey, H. Doyeux, and S. Ciná, Appl. Phys. Lett. 0003-6951 87, 213502 (2005). 10.1063/1.2133922
17. F. H. Fabreguette, R. A. Wind, and S. M. George, Appl. Phys. Lett. 0003-6951 88, 013116 (2006). 10.1063/1.2161117
18. A. Szeghalmi, S. Senz, M. Bretschneider, U. Gösele, and M. Knez, Appl. Phys. Lett. 0003-6951 94, 133111 (2009). 10.1063/1.3114402