Electroplating to visualize defects in Al2O3 thin films grown using atomic layer deposition

Thin Solid Films

Volumn 517, Issue 11, 2009, Pages 3269-3272

  Zhang, Yadong ^a   Bertrand, Jacob A ^b   Yang, Ronggui ^a   George, Steven M ^b   Lee, Y C ^a  

^a UCB 450   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

Atomic Layer Deposition (ALD); Defect Visualization; Diffusion Barriers; Electroplating; Thin Films

Indexed keywords

EID: 62849116721     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.12.052     Document Type: Letter

References (25)

1. Ritala M., and Leskela M. In: Nawla H.S. (Ed). Handbook of Thin Film Materials vol. 1 (2001), Academic, San Diego 103
2. George S.M., Ott A.W., and Klaus J.W. J. Phys. Chem. 100 (1996) 13121
3. Lim B.S., Rahtu A., Rouffignac P.D., and Gordon R.G. Appl. Phys. Lett. 84 (2004) 3957
4. Ghosh A.P., Gerenser L.J., Jarman C.M., and Fornalik J.E. Appl. Phys. Lett. 86 (2005) 223503
5. Groner M.D., George S.M., McLean R.S., and Carcia P.F. Appl. Phys. Lett. 88 (2006) 051907
6. Carcia P.F., McLean R.S., Reilly M.H., Groner M.D., and George S.M. App. Phys. Lett. 89 (2006) 031915
7. Langereis E., Creatore M., Heil S.B.S., van de Sanden M.C.M., and Kesselsb W.M.M. Appl. Phys. Lett. 89 (2006) 081915
8. Tripp M.K., Stampfer C., Miller D.C., Helbling T., Herrmann C.F., Hierold C., Gall K., George S.M., and Bright V.M. Sens. Actuator A 130 (2006) 419
9. Herrmann C.F., Fabreguette F.H., Finch D.S., Geiss R., and George S.M. Appl. Phys. Lett. 87 (2005) 123110
10. Chatham H. Surf. Coat. Technol. 78 (1996) 1
11. da Silva Sobrinho A.S., Czeremuszkin G., Latreche M., and Wertheimer M.R. J. Vac. Sci. Technol. A 18 (2000) 149
12. Roberts A.P., Henry B.M., Sutton A.P., Grovenor C.R.M., Briggs G.A.D., Miyamoto T., Kano M., Tsukahara Y., and Yanaka M. J. Membr. Sci. 208 (2002) 75
13. Graff G.L., and Williford R.E. J. Appl. Phys. 96 (2004) 1840
14. Lewis J.S., and Weaver M.S. IEEE J. Sel. Top. Quantum Electron. 10 (2004) 45
15. Grego S., Lewis J., Vick E., and Temple D. Thin Solid Films 515 (2007) 4745
16. Kroll M., Blau W.J., Grandjean D., Benfield R.E., Luis F., Paulus P.M., and de Jongh L.J. J. Magn. Magn. Mater. 249 (2002) 241
17. Bassett G.A. Philos. Mag. 3 (1958) 1042
18. Allen D., Schad R., Zangari G., Zana L., Yang D., Tondra M., and Wang D. J. Appl. Phys. 87 (2000) 5188
19. Schad R., Allen D., Zangari G., Zana L., Yang D., Tondra M., and Wang D. Appl. Phys. Lett. 76 (2000) 607
20. Allen D., Schad R., Zangari G., Zana L., Yang D., Tondra M., and Wang D. J. Vac. Sci. Technol. A 18 (2000) 1830
21. Allen D., Schad R., Zangari G., Zana L., Tondra M., Wang D., and Reed D. J. Appl. Phys. 89 (2000) 6662
22. Groner M.D., Fabreguette F.H., Elam J.W., and George S.M. Chem. Mater. 16 (2004) 639
23. Groner M.D., Elam J.W., Fabreguette F.H., and George S.M. Thin Solid Films 413 (2002) 186
24. Hanika M., Langowski H.C., Moosheimer U., and Peukert W. Chem. Eng. Technol. 26 (2003) 605
25. da Silva Sobrinho A.S., Czeremuszkin G., Latreche M., Dennler G., and Wertheimer M.R. Surf. Coat. Technol. 1204 (1999) 116