Optical characterization of textured SnO 2:F layers using spectroscopic ellipsometry

Journal of Applied Physics

Volumn 112, Issue 8, 2012, Pages

  Akagawa, Masataka ^a   Fujiwara, Hiroyuki ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); CHARACTERIZATION TECHNIQUES; DRUDE MODELS; FREE CARRIER ABSORPTION; HALL MEASUREMENTS; LAYERED STRUCTURES; NON DESTRUCTIVE; OPTICAL CHARACTERIZATION; RELIABLE MEASUREMENT; SCANNING ELECTRON MICROSCOPE; THIN-FILM SOLAR CELLS; TRANSPARENT CONDUCTIVE OXIDES;

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; ELECTRON MOBILITY; OPTICAL CONSTANTS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY;

F REGION;

EID: 84868369452     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4759054     Document Type: Article

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