In situ spectroscopic ellipsometry growth studies on the Al-doped ZnO films deposited by remote plasma-enhanced metalorganic chemical vapor deposition

Journal of Applied Physics

Volumn 103, Issue 3, 2008, Pages

  Volintiru, I ^a   Creatore, M ^a   Van De Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS;

ELECTRON TRANSPORT; PILLARLIKE MODE; SPECTROSCOPIC ELLIPSOMETRY (SE);

ZINC OXIDE;

EID: 39349104529     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2837109     Document Type: Article

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