From the physics of secondary electron emission to image contrasts in scanning electron microscopy

Journal of Electron Microscopy

Volumn 61, Issue 5, 2012, Pages 261-284

  Cazaux, Jacques ^a  

^a Université de Reims Champagne Ardenne   (France)

Author keywords

material contrast and topographic contrast; scanning electron microscopy; secondary electron emission; SEM metrology and testing

Indexed keywords

ELECTRON; IMAGE PROCESSING; METHODOLOGY; PHYSICS; REVIEW; SCANNING ELECTRON MICROSCOPY; THEORETICAL MODEL;

ELECTRONS; IMAGE PROCESSING, COMPUTER-ASSISTED; MICROSCOPY, ELECTRON, SCANNING; MODELS, THEORETICAL; PHYSICS;

ELECTRONS; SECONDARY EMISSION;

ELECTRON EMISSION YIELDS; FIELD-EFFECT; IMAGE CONTRASTS; MATERIAL CONTRAST AND TOPOGRAPHIC CONTRAST; PHYSICAL PROCESS; SCANNING ELECTRON MICROSCOPY METROLOGY AND TESTING; SECONDARY ELECTRON EMISSIONS; SECONDARY ELECTRONS; SUB-SURFACES; TECHNICAL PROCESS;

SCANNING ELECTRON MICROSCOPY;

EID: 84867568349     PISSN: 00220744     EISSN: 14779986     Source Type: Journal    
DOI: 10.1093/jmicro/dfs048     Document Type: Review

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