Energy selective scanning electron microscopy to reduce the effect of contamination layers on scanning electron microscope dopant mapping

Ultramicroscopy

Volumn 110, Issue 9, 2010, Pages 1185-1191

  Rodenburg, C ^a   Jepson, M A E ^a   Bosch, E G T ^b   Dapor, M ^c  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b Thermo Fisher Scientific   (United States)

^c UNIVERSITY OF TRENTO   (Italy)

Author keywords

Detector transfer modelling; Dopant mapping; Energy selective SEM; Silicon

Indexed keywords

CONTAMINATION LAYERS; DOPANT CONTRAST; ENERGY SELECTION; ENERGY SELECTIVE SEM; MONTE CARLO; RESOLUTION IMPROVEMENT; SCANNING ELECTRON MICROSCOPE; SECONDARY ELECTRONS; SELECTIVE SCANNING; SEM;

DETECTORS; ELECTRONS; MAPPING; SCANNING;

SCANNING ELECTRON MICROSCOPY;

SILICON;

ARTICLE; CONTRAST ENHANCEMENT; CONTROLLED STUDY; ENERGY SELECTIVE SCANNING ELECTRON MICROSCOPY; IMAGE PROCESSING; IMAGE QUALITY; MATERIAL COATING; MONTE CARLO METHOD; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 77955514042     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.04.008     Document Type: Article

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