Air-based deposition and processing windows of sputtered TiN, TiN xO y, and N-doped TiO x thin films

Surface and Coatings Technology

Volumn 210, Issue , 2012, Pages 135-141

  Chan, Mu Hsuan ^a   Lu, Fu Hsing ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Air; Low vacuum; N doped TiO x; Sputtering; TiN; TiN xO y

Indexed keywords

AIR CONTENT; BASE PRESSURE; GASEOUS MIXTURE; LOW-VACUUM; N-DOPED TIO; OXYNITRIDE FILMS; PLASMA ENVIRONMENTS; PROCESSING TIME; PROCESSING WINDOWS; REACTIVE GAS; SINGLE LAYER; SPUTTERING POWER;

SPUTTERING; TIN;

AIR;

EID: 84867442379     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.09.004     Document Type: Article

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