SCOPUS 정보 검색 플랫폼

Volumn 517, Issue 17, 2009, Pages 5006-5009

X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures

(2) Chan, Mu Hsuan a Lu, Fu Hsing a

a NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

Author keywords

Air; Sputtering; Titanium oxynitride films; X ray photoelectron spectroscopy (XPS)

Indexed keywords

BASE PRESSURE; CHEMICAL STATE; D.C. MAGNETRON SPUTTERING; DEPTH-PROFILE ANALYSIS; FILM/SUBSTRATE INTERFACE; OXYGEN CONTENT; PROCESSING TIME; TITANIUM OXYNITRIDE; TITANIUM OXYNITRIDE FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); XPS; XPS ANALYSIS;

ELECTRON SPECTROSCOPY; ELECTRONS; FILM PREPARATION; MAGNETRONS; MOLECULAR ORBITALS; NITRIDES; OXYGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SPECTRUM ANALYSIS; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE; X RAY ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65649115136 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.03.100 Document Type: Article

Times cited : (75)

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