Structure, composition, and morphology of photoelectrochemically active TiO 2-xN x thin films deposited by reactive DC magnetron sputtering

Journal of Physical Chemistry B

Volumn 108, Issue 52, 2004, Pages 20193-20198

  Mwabora, Julius M ^a,d   Lindgren, Torbjörn ^a   Avendaño, Esteban ^a   Jaramillo, Thomas F ^b   Lu, Jnn ^a   Lindquist, Sten Eric ^c   Granqvist, Claes Göran ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b University of California   (United States)

^c UPPSALA UNIVERSITY   (Sweden)

^d UNIVERSITY OF NAIROBI   (Kenya)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHROMIC DISPLAYS; OPTICAL DATA; PHOTOACTIVE SPECTRUM; SPUTTER GAS;

ATOMIC FORCE MICROSCOPY; COMPOSITION; CRYSTAL STRUCTURE; DOPING (ADDITIVES); MAGNETRON SPUTTERING; MORPHOLOGY; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 11344251999     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0368987     Document Type: Article

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