Preparation of titanium oxynitride thin films by reactive sputtering using air/Ar mixtures

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 614-618

  Chan, Mu Hsuan ^a   Lu, Fu Hsing ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Air; High base pressure; Magnetron sputtering; Titanium oxynitride

Indexed keywords

COLOR FILMS; DIFFRACTION; ELECTRIC RESISTANCE; HOLOGRAPHIC INTERFEROMETRY; LIGHT; MAGNETRON SPUTTERING; MAGNETRONS; NITRIDES; OXYGEN; PHOTOELECTRON SPECTROSCOPY; REACTIVE SPUTTERING; THICK FILMS; TIN; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

BASE PRESSURES; ELECTRICAL RESISTIVITIES; FLOW RATIOS; HIGH BASE PRESSURE; LOW VACUUMS; OXYGEN CONTENTS; POISONING EFFECTS; PREFERRED ORIENTATIONS; PROCESSING TIMES; REACTIVE GASSES; SALT STRUCTURES; THICKNESS OF THE FILMS; TITANIUM OXY NITRIDES; TITANIUM OXYNITRIDE; X-RAY PHOTOELECTRON SPECTROSCOPIES;

FILM PREPARATION;

EID: 55749102737     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.04.094     Document Type: Article

References (25)

1. Yang X., Li C., Yang B., Wang W., and Qian Y. Chem. Phys. Lett. 383 (2004) 502
2. Vaz F., Cerqueira P., Rebouta L., Nascimento S.M.C., and Alves E. Thin Solid Films 447-448 (2004) 449
3. Chappe J.M., Martin N., and Lintymer J. Appl. Surf. Sci. 253 (2007) 5312
4. Shin C.H., Bugli G., and Mariadassou G.D. J. Solid State Chem. 95 (1991) 145
5. Cuong N.D., Kim D.J., Kang B.D., and Yoon S.G. J. Electrochem. Soc. 153 9 (2006) G856
6. Nunes C., Teixeira V., Prates M.L., Barradas N.P., and Sequeira A.D. Thin Solid Films 442 (2003) 173
7. Koerner R.J., Butterworth L.A., Mayer I.V., Dasbach R., and Busscher H.J. Biomaterials 23 (2002) 2835
8. Vaz F., Cerqueira P., Rebouta L., Nascimento S.M.C., Alves E., Goudeau Ph., and Riviere J.P. Surf. Coat. Technol. 174-175 (2003) 197
9. Kazemeini M.H., Berezin A.A., and Fukuhara N. Thin Solid Films 372 (2000) 70
10. Shirley D.A. Phys. Rev., B 5 (1972) 4709
11. Powder Diffraction File. PDF-2 CDROM (2002), International Center for Diffraction Data, Newtown Square, PA
12. Fabreguette F., Imhoff L., Guillot J., Domenichini B., Marco de Lucas M.C., Sibillot P., Bourgeois S., and Sacilotti M. Surf. Coat. Technol. 125 (2000) 396
13. Chang S.L. X-ray Multiple-wave Diffraction: Theory and Application (2004), Springer Verlag, New York
14. Lu F.-H., and Lo W.-Z. J. Vac. Sci. Technol., A 22 5 (2004) 2071
15. Huang J.H., Lau K.W., and Yu G.P. Surf. Coat. Technol. 191 (2005) 17
16. Barrett C.S., and Massalski T.B. Structure of Materials (1980), McGraw-Hill, Colorado 204 pp.
17. Makino Y., Nose M., Tanaka T., Misawa M., Tanimoto A., Nakai T., Kato K., and Nogi K. Surf. Coat. Technol. 98 (1998) 934
18. Kuznetsov M.V., Ahuravlev J.F., and Gubanov V.A. J. Electron Spectrosc. Relat. Phenom. 58 (1992) 169
19. Kuznetsov M.V., Ahuravlev J.F., Zhilyaev V.A., and Gubanov V.A. J. Electron Spectrosc. Relat. Phenom. 58 (1992) 1
20. Saha N.C., and Tompkins H.G. J. Appl. Phys. 72 (1992) 3072
21. Braic M., Balaceanu M., Vladescu A., Kiss A., Braic V., Epurescu G., Dinescu G., Moldovan A., Birjega R., and Dinescu M. Appl. Surf. Sci. 253 (2007) 8210
22. Watts J.F., and Wolstenholme J. An Introduction to Surface Analysis by XPS and AES (2003), John Wiley & Sons, England 76 pp.
23. Cuong N.D., Kim D.J., Kang B.D., and Yoon S.G. Microelectron. Reliab. 47 (2007) 752
24. Sundgren J.E., Johansson B.O., Rockett A., Barnett S.A., and Greene J.E. In: Sproul W.D., Greene J.E., and Thornton J.A. (Eds). Physics and Chemistry of Protective Coatings (1986), American Institute of Physics, Massachusetts 95
25. Chou W.J., Yu G.P., and Huang J.H. Surf. Coat. Technol. 140 (2001) 206