Nucleation kinetics during homoepitaxial growth of TiN(001) by reactive magnetron sputtering

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 3, 2004, Pages

  Wall, Marcel A ^a   Cahill, David G ^a   Petrov, I ^a   Gall, D ^a   Greene, J E ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NITROGEN; TITANIUM;

AB INITIO CALCULATION; ARTICLE; CHEMICAL REACTION KINETICS; CLUSTER ANALYSIS; DIFFUSION; ENERGY; HIGH TEMPERATURE; MICROWAVE OVEN; MOLECULE; SCANNING TUNNELING MICROSCOPY; SURFACE PROPERTY; TEMPERATURE; VACUUM;

EID: 42749100136     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.035413     Document Type: Article

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