SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 158, Issue 6, 2011, Pages

Air-based deposition of conductive nitride thin films by sputtering

(2) Chan, Mu Hsuan a Lu, Fu Hsing a

a NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BASE PRESSURE; DISSOCIATION ENERGIES; FLOW RATIOS; LOW VACUUM; MODEL SYSTEM; NITRIDE FILMS; NITRIDE STRUCTURES; NITRIDE THIN FILMS; PROCESSING TIME; REACTIVE GAS; ROCK SALT; THERMODYNAMIC PREDICTIONS; TIN FILMS;

CONDUCTIVE FILMS; DEPOSITION; DISSOLUTION; METALLIC FILMS; NITROGEN PLASMA; OXYGEN; TITANIUM NITRIDE;

NITROGEN;

EID: 79955538373 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3571037 Document Type: Article

Times cited : (12)

References (45)

1
- 0004120302
- Encyclopedia of Inorganic Chemistry
- in, John Wiley Sons, New York.
- P. Ettmayer and W. Lengauer, in Nitrides: Transition Metal Solid State Chemistry, R. B. King, Editor, p. 2498, Encyclopedia of Inorganic Chemistry., John Wiley Sons, New York (1994).
- (1994) Nitrides: Transition Metal Solid State Chemistry , pp. 2498
- Ettmayer, P.¹ Lengauer, W.² King Editor, R.B.³

2
- 0022080421
- Structure and properties of tin coatings
- DOI 10.1016/0040-6090(85)90333-5
- J. E. Sundgren, Thin Solid Films, 128, 21 (1985). 10.1016/0040-6090(85) 90333-5 (Pubitemid 15585779)
- (1985) Thin Solid Films , vol.128 , Issue.1-2 , pp. 21-44
- Sundgren, J.-E.¹

3
- 25144433544
- Control of reactive sputtering processes
- DOI 10.1016/j.tsf.2005.05.022, PII S0040609005005389
- W. D. Sproul, D. J. Christie, and D. C. Carter, Thin Solid Films, 491, 1 (2005). 10.1016/j.tsf.2005.05.022 (Pubitemid 41348621)
- (2005) Thin Solid Films , vol.491 , Issue.1-2 , pp. 1-17
- Sproul, W.D.¹ Christie, D.J.² Carter, D.C.³

4
- 2642571813
- 10.1016/j.actamat.2004.03.022
- J. M. Cairney, R. Tsukano, M. J. Hoffman, and M. Yang, Acta Mater., 52, 3229 (2004). 10.1016/j.actamat.2004.03.022
- (2004) Acta Mater. , vol.52 , pp. 3229
- Cairney, J.M.¹ Tsukano, R.² Hoffman, M.J.³ Yang, M.⁴

5
- 25144436730
- Surface kinetics and subplantation phenomena affecting the texture, morphology, stress, and growth evolution of titanium nitride films
- DOI 10.1063/1.1811389
- P. Patsalas, C. Gravalidis, and S. Logothetidis, J. Appl. Phys., 96, 6234 (2004). 10.1063/1.1811389 (Pubitemid 44938191)
- (2004) Journal of Applied Physics , vol.96 , Issue.11 , pp. 6234-6235
- Patsalas, P.¹ Gravalidis, C.² Logothetidis, S.³

6
- 42749100136
- 10.1103/PhysRevB.70.035413
- M. A. Wall, D. G. Cahill, I. Petrov, D. Gall, and J. E. Greene, Phys. Rev. B, 70, 035413 (2004). 10.1103/PhysRevB.70.035413
- (2004) Phys. Rev. B , vol.70 , pp. 035413
- Wall, M.A.¹ Cahill, D.G.² Petrov, I.³ Gall, D.⁴ Greene, J.E.⁵

7
- 0027680406
- 10.1016/0924-0136(93)90016-Y
- S. Y. Zhang and W. G. Zhu, J. Mater. Process. Technol., 39, 165 (1993). 10.1016/0924-0136(93)90016-Y
- (1993) J. Mater. Process. Technol. , vol.39 , pp. 165
- Zhang, S.Y.¹ Zhu, W.G.²

8
- 31144461029
- Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition
- DOI 10.1116/1.1839895
- M. Matsuoka, S. Isotani, J. C. R. Mittani, J. F. D. Chubaci, K. Ogata, and N. Kuratani, J. Vac. Sci. Technol. A, 23, 137 (2005). 10.1116/1.1839895 (Pubitemid 43126418)
- (2005) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.23 , Issue.1 , pp. 137-141
- Matsuoka, M.¹ Isotani, S.² Mittani, J.C.R.³ Chubaci, J.F.D.⁴ Ogata, K.⁵ Kuratani, N.⁶

9
- 33751500052
- 10.1021/cm00018a034
- R. Fix, R. G. Gordon, and D. M. Hoffman, Chem. Mater., 3, 1138 (1991). 10.1021/cm00018a034
- (1991) Chem. Mater. , vol.3 , pp. 1138
- Fix, R.¹ Gordon, R.G.² Hoffman, D.M.³

10
- 0036672187
- Variation of color in titanium and zirconium nitride decorative thin films
- DOI 10.1016/S0040-6090(02)00530-8, PII S0040609002005308
- S. Niyomsoan, W. Grant, D. L. Olson, and B. Mishra, Thin Solid Films, 415, 187 (2002). 10.1016/S0040-6090(02)00530-8 (Pubitemid 34992124)
- (2002) Thin Solid Films , vol.415 , Issue.1-2 , pp. 187-194
- Niyomsoan, S.¹ Grant, W.² Olson, D.L.³ Mishra, B.⁴

11
- 1342347468
- 10.1016/S0040-6090(03)01123-4
- F. Vaz, P. Cerqueira, L. Rebouta, S. M. C. Nascimento, E. Alves, Ph. Goudeau, J. P. Riviere, K. Pischow, and J. de Rijk, Thin Solid Films, 447-448, 449 (2004). 10.1016/S0040-6090(03)01123-4
- (2004) Thin Solid Films , vol.447-448 , pp. 449
- Vaz, F.¹ Cerqueira, P.² Rebouta, L.³ Nascimento, S.M.C.⁴ Alves, E.⁵ Goudeau, Ph.⁶ Riviere, J.P.⁷ Pischow, K.⁸ De Rijk, J.⁹

12
- 65649115136
- 10.1016/j.tsf.2009.03.100
- M.-H. Chan and F.-H. Lu, Thin Solid Films, 517, 5006 (2009). 10.1016/j.tsf.2009.03.100
- (2009) Thin Solid Films , vol.517 , pp. 5006
- Chan, M.-H.¹ Lu, F.-H.²

13
- 77956872856
- 10.1016/j.tsf.2010.04.097
- M.-H. Chan, P.-L. Wu, and F.-H. Lu, Thin Solid Films, 518, 7300 (2010). 10.1016/j.tsf.2010.04.097
- (2010) Thin Solid Films , vol.518 , pp. 7300
- Chan, M.-H.¹ Wu, P.-L.² Lu, F.-H.³

14
- 0842269183
- 10.1016/j.elspec.2003.10.004
- S. Agouram, F. Bodart, and G. Terwagne, J. Electron. Spectrosc. Relat. Phenom., 134, 173 (2004). 10.1016/j.elspec.2003.10.004
- (2004) J. Electron. Spectrosc. Relat. Phenom. , vol.134 , pp. 173
- Agouram, S.¹ Bodart, F.² Terwagne, G.³

15
- 70449499637
- 10.1016/j.tsf.2009.09.062
- M.-H. Chan and F.-H. Lu, Thin Solid Films, 518, 1369 (2009). 10.1016/j.tsf.2009.09.062
- (2009) Thin Solid Films , vol.518 , pp. 1369
- Chan, M.-H.¹ Lu, F.-H.²

16
- 72649090077
- 10.1016/j.apcatb.2009.09.032
- S.-H. Lee, E. Yamasue, K. N. Ishihara, and H. Okumura, Appl. Catal., B, 93, 217 (2010). 10.1016/j.apcatb.2009.09.032
- (2010) Appl. Catal., B , vol.93 , pp. 217
- Lee, S.-H.¹ Yamasue, E.² Ishihara, K.N.³ Okumura, H.⁴

17
- 79955547496
- Powder Diffraction File. PDF-2 CDROM, International Center for Diffraction Data, Newtown Square, PA (2000). Ti: #44-1294; TiN #38-1420; TiO #77-2170; Ti3O5 #89-4733; TiO2 #21-1272.
- Powder Diffraction File. PDF-2 CDROM, International Center for Diffraction Data, Newtown Square, PA (2000). Ti: #44-1294; TiN #38-1420; TiO #77-2170; Ti3O5 #89-4733; TiO2 #21-1272.

18
- 68249162275
- 10.1016/j.jpowsour.2008.12.112
- A. Trenczek-Zajac, M. Radecka, K. Zakrzewska, A. Brudnik, E. Kusior, S. Bourgeois, M. C. Marco de Lucas, and L. Imhoff, J. Power Sources, 194, 93 (2009). 10.1016/j.jpowsour.2008.12.112
- (2009) J. Power Sources , vol.194 , pp. 93
- Trenczek-Zajac, A.¹ Radecka, M.² Zakrzewska, K.³ Brudnik, A.⁴ Kusior, E.⁵ Bourgeois, S.⁶ Marco De Lucas, M.C.⁷ Imhoff, L.⁸

19
- 0347753695
- 10.1016/j.cplett.2003.11.037
- X. Yang, C. Li, B. Yang, W. Wang, and Y. Qia, Chem. Phys. Lett., 383, 502 (2004). 10.1016/j.cplett.2003.11.037
- (2004) Chem. Phys. Lett. , vol.383 , pp. 502
- Yang, X.¹ Li, C.² Yang, B.³ Wang, W.⁴ Qia, Y.⁵

20
- 41949141624
- 10.1016/0368-2048(92)80001-O
- M. V. Kuznetsov, J. F. Ahuravlev, V. A. Zhilyaev, and V. A. Gubanov, J. Electron. Spectrosc. Relat. Phenom., 58, 1 (1992). 10.1016/0368-2048(92)80001-O
- (1992) J. Electron. Spectrosc. Relat. Phenom. , vol.58 , pp. 1
- Kuznetsov, M.V.¹ Ahuravlev, J.F.² Zhilyaev, V.A.³ Gubanov, V.A.⁴

21
- 0010366871
- 10.1016/0368-2048(92)80016-2
- M. V. Kuznetsov, J. F Ahuravlev, and V. A. Gubanov, J. Electron. Spectrosc. Relat. Phenom., 58, 169 (1992). 10.1016/0368-2048(92)80016-2
- (1992) J. Electron. Spectrosc. Relat. Phenom. , vol.58 , pp. 169
- Kuznetsov, M.V.¹ Ahuravlev, J.F.² Gubanov, V.A.³

22
- 33746329304
- y nanopowders of spherical particle morphology
- DOI 10.1021/cm060522z
- M. Dryga, C. Czosnek, R. T. Paine, and J. F. Janik, Chem. Mater., 18, 3122 (2006). 10.1021/cm060522z (Pubitemid 44116091)
- (2006) Chemistry of Materials , vol.18 , Issue.13 , pp. 3122-3129
- Drygas, M.¹ Czosnek, C.² Paine, R.T.³ Janik, J.F.⁴

23
- 0028065558
- 10.1016/0257-8972(94)90068-X
- J. S. Colligon, H. Kheyrandish, L. N. Lesnevsky, A. Naumkin, A. Rogozin, I. I. Shkarban, L. Vasilyev, and V. E. Yurasova, Surf. Coat. Technol., 70, 9 (1994). 10.1016/0257-8972(94)90068-X
- (1994) Surf. Coat. Technol. , vol.70 , pp. 9
- Colligon, J.S.¹ Kheyrandish, H.² Lesnevsky, L.N.³ Naumkin, A.⁴ Rogozin, A.⁵ Shkarban, I.I.⁶ Vasilyev, L.⁷ Yurasova, V.E.⁸

24
- 2942650057
- J. F. Watts and J. Wolstenholme, An Introduction to Surface Analysis by XPS and AES, p. 76, John Wiley Sons, England (2003).
- (2003) An Introduction to Surface Analysis by XPS and AES , pp. 76
- Watts, J.F.¹ Wolstenholme, J.²

25
- 0003666891
- J. L. Murray, Phase Diagram of Binary Titanium Alloys, p. 176, ASM International, Ohio (1987).
- (1987) Phase Diagram of Binary Titanium Alloys , pp. 176
- Murray, J.L.¹

26
- 35949021521
- 10.1103/PhysRevB.28.3214
- L. Porte, L. Roux, and J. Hanus, Phys. Rev. B, 28, 3214 (1983). 10.1103/PhysRevB.28.3214
- (1983) Phys. Rev. B , vol.28 , pp. 3214
- Porte, L.¹ Roux, L.² Hanus, J.³

27
- 10244253937
- Effect of nitrogen flow rate on structure and properties of nanocrystalline TiN thin films produced by unbalanced magnetron sputtering
- DOI 10.1016/j.surfcoat.2004.07.066, PII S0257897204005900
- J. H. Huang, K. W. Lau, and G. P. Yu, Surf. Coat. Technol., 191, 17 (2005). 10.1016/j.surfcoat.2004.07.066 (Pubitemid 39621316)
- (2005) Surface and Coatings Technology , vol.191 , Issue.1 , pp. 17-24
- Huang, J.-H.¹ Lau, K.-W.² Yu, G.-P.³

28
- 0035387766
- Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique
- DOI 10.1016/S0257-8972(01)01149-5, PII S0257897201011495, Proceedings of the 7th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 17-21, 2000
- N. Martin, R. Sanjinés, J. Takadoum, and F. Lévy, Surf. Coat. Technol., 142-144, 615 (2001). 10.1016/S0257-8972(01)01149-5 (Pubitemid 32931768)
- (2001) Surface and Coatings Technology , vol.142-144 , pp. 615-620
- Martin, N.¹ Sanjines, R.² Takadoum, J.³ Levy, F.⁴

29
- 33748922073
- Formation of Ti and TiN ultra-thin films on Si by ion beam sputter deposition
- DOI 10.1016/j.susc.2006.01.080, PII S0039602806003451
- A. Styervoyedov and V. Farenik, Surf. Sci., 600, 3766 (2006). 10.1016/j.susc.2006.01.080 (Pubitemid 44436368)
- (2006) Surface Science , vol.600 , Issue.18 , pp. 3766-3769
- Styervoyedov, A.¹ Farenik, V.²

30
- 52949110564
- 10.1016/j.vacuum.2008.04.014
- T. Nakano, K. Hoshi, and S. Baba, Vacuum, 83, 467 (2009). 10.1016/j.vacuum.2008.04.014
- (2009) Vacuum , vol.83 , pp. 467
- Nakano, T.¹ Hoshi, K.² Baba, S.³

31
- 33747146755
- y thin films revealed and quantified by XPS factorial analysis
- DOI 10.1016/j.actamat.2006.02.042, PII S1359645406001820
- J. Guillot, J. M. Chappé, O. Heintz, N. Martin, L. Imhoff, and J. Takadoum, Acta Mater. 54, 3067 (2006). 10.1016/j.actamat.2006.02.042 (Pubitemid 44218835)
- (2006) Acta Materialia , vol.54 , Issue.11 , pp. 3067-3074
- Guillot, J.¹ Chappe, J.-M.² Heintz, O.³ Martin, N.⁴ Imhoff, L.⁵ Takadoum, J.⁶

32
- 0029208634
- 10.1016/0040-6090(94)06259-N
- M. E. Day, M. Delfino, J. A. Fair, and W. Tsai, Thin Solid Films, 254, 285 (1995). 10.1016/0040-6090(94)06259-N
- (1995) Thin Solid Films , vol.254 , pp. 285
- Day, M.E.¹ Delfino, M.² Fair, J.A.³ Tsai, W.⁴

33
- 0003987270
- Handbook of Refractory Carbides and Nitrides
- H. O. Pierson. Handbook of Refractory Carbides and Nitrides.: Properties, Characteristics, Processing, and Applications, p. 193, William Andrew, New Jersey (1996).
- (1996) Properties, Characteristics, Processing, and Applications , pp. 193
- Pierson, H.O.¹

34
- 0035978380
- Deposition of TiN thin films on Si(100) by HCD ion plating
- DOI 10.1016/S0257-8972(01)01120-3, PII S0257897201011203
- W. J. Chou, G. P. Yu, and J. H. Huang, Surf. Coat. Technol., 140, 206 (2001). 10.1016/S0257-8972(01)01120-3 (Pubitemid 32548603)
- (2001) Surface and Coatings Technology , vol.140 , Issue.3 , pp. 206-214
- Chou, W.-J.¹ Yu, G.-P.² Huang, J.-H.³

35
- 0030261472
- The mechanical and structural properties of Ti films prepared by filtered arc deposition
- DOI 10.1016/0042-207X(96)00192-3, PII S0042207X96001923
- A. Bendavid, P. J. Martin, G. B. Smith, L. Wielunski, and T. J. Kinder, Vacuum, 47, 1179 (1996). 10.1016/0042-207X(96)00192-3 (Pubitemid 126364609)
- (1996) Vacuum , vol.47 , Issue.10 , pp. 1179-1188
- Bendavid, A.¹ Martin, P.J.² Smith, G.B.³ Wielunski, L.⁴ Kinder, T.J.⁵

36
- 33745293437
- Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering
- DOI 10.1063/1.2197287
- G. Abadias, Y. Y. Tse, Ph. Guérin, and V. Pelosin, J. Appl. Phys., 99, 113519 (2006). 10.1063/1.2197287 (Pubitemid 43932602)
- (2006) Journal of Applied Physics , vol.99 , Issue.11 , pp. 113519
- Abadias, G.¹ Tse, Y.Y.² Guerin, Ph.³ Pelosin, V.⁴

37
- 16344370413
- A quantitative study of the hardness of a superhard nanocrystalline titanium nitride/silicon nitride coating
- DOI 10.1016/j.scriptamat.2005.02.024, PII S1359646205001181
- F. Kauffmann, B. Ji, G. Dehm, H. Gao, and E. Arzt, Scr. Mater., 52, 1269 (2005). 10.1016/j.scriptamat.2005.02.024 (Pubitemid 40467158)
- (2005) Scripta Materialia , vol.52 , Issue.12 , pp. 1269-1274
- Kauffmann, F.¹ Ji, B.² Dehm, G.³ Gao, H.⁴ Arzt, E.⁵

38
- 0003477976
- in, 3rd ed., G. Platzki, Editor, p, VCH Publishers, New York.
- I. Barin, in Thermochemical Data of Pure Substances, 3rd ed., G. Platzki, Editor, pp. 567-1880, VCH Publishers, New York (1996).
- (1996) Thermochemical Data of Pure Substances , pp. 567-1880
- Barin, I.¹

39
- 68149108652
- 10.1557/jmr.2009.0288
- F.-H. Lu, B.-F. Jiang, J.-L. Lo, and M.-H. Chan, J. Mater. Res., 24, 2400 (2009). 10.1557/jmr.2009.0288
- (2009) J. Mater. Res. , vol.24 , pp. 2400
- Lu, F.-H.¹ Jiang, B.-F.² Lo, J.-L.³ Chan, M.-H.⁴

40
- 36449002190
- 10.1063/1.106285
- A. Calka, Appl. Phys. Lett., 59, 1568 (1991). 10.1063/1.106285
- (1991) Appl. Phys. Lett. , vol.59 , pp. 1568
- Calka, A.¹

41
- 0030141868
- 10.1088/0022-3727/29/5/037
- H. Zhang, E. H. Kisi, and S. Myhra, J. Phys. D: Appl. Phys., 29, 1367 (1996). 10.1088/0022-3727/29/5/037
- (1996) J. Phys. D: Appl. Phys. , vol.29 , pp. 1367
- Zhang, H.¹ Kisi, E.H.² Myhra, S.³

42
- 0027551693
- Dynamics of phase forming processes in the combustion of metal-gas systems
- DOI 10.1016/0010-2180(93)90032-X
- I. O. Khomenko, A. S. Mukasyan, V. I. Ponomaryev, I. P. Borovinskaya, and A. G. Merzhanov, Combust. Flame., 92, 201 (1993). 10.1016/0010-2180(93)90032-X (Pubitemid 23069657)
- (1993) Combustion and Flame , vol.92 , Issue.3 , pp. 201-208
- Khomenko, I.O.¹ Mukasyan, A.S.² Ponomaryev, V.I.³ Borovinskaya, I.P.⁴ Merzhanov, A.G.⁵

43
- 0003522850
- A. Grill, Cold Plasma in Material Fabrication, p. 21, IEEE, New York (1994).
- (1994) Cold Plasma in Material Fabrication , pp. 21
- Grill, A.¹

44
- 0003399263
- p, 345, Noyes Publications, New York.
- D. M. Mattox, Handbook of Physical Vapor Deposition (PVD) Processing, pp. 237, 345, Noyes Publications, New York (1998).
- (1998) Handbook of Physical Vapor Deposition (PVD) Processing , pp. 237
- Mattox, D.M.¹

45
- 0003644433
- 2nd ed., Noyes Publications, New York.
- R.F. Bunshaw, Handbook of Deposition Technologies for Films and Coatings, 2nd ed., p. 70, Noyes Publications, New York (1994).
- (1994) Handbook of Deposition Technologies for Films and Coatings , pp. 70
- Bunshaw, R.F.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.