Effect of ambient gas on structural and optical properties of titanium oxynitride films

Applied Surface Science

Volumn 256, Issue 13, 2010, Pages 4129-4135

  Rawal, Sushant K ^a   Chawla, Amit Kumar ^a   Chawla, Vipin ^a   Jayaganthan, R ^a   Chandra, Ramesh ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

Author keywords

Band gap; Hydrophobic; Penning ionization; RF sputtering; Titanium oxynitride

Indexed keywords

ARGON; CONTACT ANGLE; CRYSTALLITE SIZE; ENERGY GAP; FILM PREPARATION; HELIUM; HYDROPHOBICITY; IONIZATION OF GASES; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; MIXTURES; NITRIDES; OPTICAL PROPERTIES; OXYGEN; PARTIAL PRESSURE; PROFILOMETRY; SUBSTRATES; X RAY DIFFRACTION;

HYDROPHOBIC; OPTICAL TRANSMISSION DATA; OXYGEN PARTIAL PRESSURE; PENNING IONIZATION; REACTIVE RF MAGNETRON SPUTTERING; RF-SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES; TITANIUM OXYNITRIDE;

TITANIUM COMPOUNDS;

EID: 77950518080     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.01.096     Document Type: Article

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