Preparation of ZrNxOy films by magnetron sputtering using air as a reactive gas

Thin Solid Films

Volumn 518, Issue 24, 2010, Pages 7300-7303

  Chan, Mu Hsuan ^a   Wu, Po Lun ^a   Lu, Fu Hsing ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Air; Optical band gap; Sputtering; Zirconium oxynitride

Indexed keywords

ATOMIC COMPOSITIONS; BAND GAPS; BASE PRESSURE; CHEMICAL BINDING; D.C. MAGNETRON SPUTTERING; FLOW RATIOS; LOW VACUUM; MIXED PHASIS; NITROGEN INCORPORATION; OXYNITRIDES; PROCESSING TIME; REACTIVE GAS; THICKNESS OF THE FILM; TRANSMITTANCE SPECTRA;

COLOR FILMS; CRYSTAL ATOMIC STRUCTURE; DIFFRACTION; ENERGY GAP; HOLOGRAPHIC INTERFEROMETRY; NITRIDES; OPTICAL BAND GAPS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM; ZIRCONIUM ALLOYS;

FILM PREPARATION;

EID: 77956872856     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.097     Document Type: Conference Paper

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