Preparation of magnetron sputtered TiNxOy thin films

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 197-203

  Vaz, F ^a   Cerqueira, P ^a   Rebouta, L ^a   Nascimento, S M C ^a   Alves, E ^b   Goudeau, Ph ^c   Riviere J P ^c  

^a UNIVERSITY OF MINHO   (Portugal)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^c UNIVERSITÉ DE POITIERS   (France)

Author keywords

Phase transitions; Sputtering; Titanium nitride; X ray diffraction

Indexed keywords

SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TITANIUM NITRIDE; X RAY DIFFRACTION;

FLOW RATE;

MAGNETRON SPUTTERING;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18544400567     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00416-X     Document Type: Article

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