Diffusion and chemical composition of TiNxOy thin films studied by Rutherford Backscattering Spectroscopy

Surface Science

Volumn 604, Issue 11-12, 2010, Pages 1010-1014

  Drogowska, K ^a   Kim Ngan, N T H ^b   Balogh, A G ^c   Radecka, M ^a   Brudnik, A ^a   Zakrzewska, K ^a   Tarnawski, Z ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

^b PEDAGOGICAL UNIVERSITY   (Poland)

^c DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Oxide surfaces; RBS; Sputtering

Indexed keywords

AMORPHOUS SILICA; ATOMIC RATIO; CARBON DIFFUSION; CARBON FOILS; CHEMICAL COMPOSITIONS; DEPTH PROFILE; INTER-DIFFUSION; OUT-DIFFUSION; OXIDE SURFACE; OXIDE SURFACES; OXYGEN ADSORPTION; OXYGEN CONTENT; OXYGEN FLOW RATES; RBS ANALYSIS; REACTIVE MAGNETRON SPUTTERING; SINGLE LAYER; SUBSTRATE TEMPERATURE; SURFACE LAYERS; XPS;

AMORPHOUS CARBON; AMORPHOUS FILMS; BACKSCATTERING; DIFFUSION; GAS ADSORPTION; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SUBSTRATES; THIN FILMS; TITANIUM NITRIDE;

CARBON FILMS;

EID: 77951621908     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2010.03.010     Document Type: Article

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