메뉴 건너뛰기




Volumn 14, Issue 7, 2012, Pages

Structure and electrical transport in films of Ge nanoparticles embedded in SiO2 matrix

Author keywords

Conduction mechanisms; Electron irradiation; Magnetron sputtering; Nanoparticles; Nanostructures; TEM

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRON IRRADIATION; ENERGY DISPERSIVE SPECTROSCOPY; GERMANIUM; MAGNETRON SPUTTERING; NANOPARTICLES; NANOSTRUCTURES; SILICA; SILICON; SIO2 NANOPARTICLES; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY;

EID: 84865765631     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-012-0930-5     Document Type: Article
Times cited : (25)

References (46)
  • 1
    • 0242304099 scopus 로고    scopus 로고
    • y for micro machined uncooled bolometer applications
    • 10.1063/1.1609633 10.1063/1.1609633 1:CAS:528:DC%2BD3sXnvVGlt7g%3D
    • y for micro machined uncooled bolometer applications J Appl Phys 94 5326 5332 10.1063/1.1609633 10.1063/1.1609633 1:CAS:528:DC%2BD3sXnvVGlt7g%3D
    • (2003) J Appl Phys , vol.94 , pp. 5326-5332
    • Ahmed, A.H.Z.1    Tait, R.N.2
  • 3
    • 40849141222 scopus 로고    scopus 로고
    • 2 structures with embedded Ge nanocrystals
    • 10.1016/j.apsusc.2007.10.075 10.1016/j.apsusc.2007.10.075 1:CAS:528:DC%2BD1cXjs1akt7c%3D
    • 2 structures with embedded Ge nanocrystals Appl Surf Sci 254 3626 3629 10.1016/j.apsusc.2007. 10.075 10.1016/j.apsusc.2007.10.075 1:CAS:528:DC%2BD1cXjs1akt7c%3D
    • (2008) Appl Surf Sci , vol.254 , pp. 3626-3629
    • Basa, P.1    Alagoz, A.S.2    Lohner, T.3    Kulakci, M.4    Turan, R.5    Nagy, K.6    Horváth, Z.7
  • 4
    • 34248550119 scopus 로고    scopus 로고
    • A transient electrical model of charging for Ge nanocrystal containing gate oxides
    • 10.1063/1.2723864 10.1063/1.2723864
    • V Beyer J von Borany M Klimenkov 2007 A transient electrical model of charging for Ge nanocrystal containing gate oxides J Appl Phys 101 094507 10.1063/1.2723864 10.1063/1.2723864
    • (2007) J Appl Phys , vol.101 , pp. 094507
    • Beyer, V.1    Von Borany, J.2    Klimenkov, M.3
  • 5
    • 36048951430 scopus 로고    scopus 로고
    • Formation of germanium nanocrystals by rapid thermal oxidizing SiGeO layer for nonvolatile memory application
    • 10.1016/j.surfcoat.2007.07.112 10.1016/j.surfcoat.2007.07.112 1:CAS:528:DC%2BD2sXhtlCnu7%2FP
    • WR Chen TC Chang PT Liu CH Tu JL Yeh YT Hsieh RY Wang CY Chang 2007 Formation of germanium nanocrystals by rapid thermal oxidizing SiGeO layer for nonvolatile memory application Surf Coat Tech 202 1333 1337 10.1016/j.surfcoat. 2007.07.112 10.1016/j.surfcoat.2007.07.112 1:CAS:528:DC%2BD2sXhtlCnu7%2FP
    • (2007) Surf Coat Tech , vol.202 , pp. 1333-1337
    • Chen, W.R.1    Chang, T.C.2    Liu, P.T.3    Tu, C.H.4    Yeh, J.L.5    Hsieh, Y.T.6    Wang, R.Y.7    Chang, C.Y.8
  • 6
    • 33645275505 scopus 로고    scopus 로고
    • Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix
    • 10.1088/0957-4484/17/8/028 10.1088/0957-4484/17/8/028 1:CAS:528:DC%2BD28XlvVyisbc%3D
    • HG Chew WK Choi YL Foo F Zheng WK Chim ZJ Voon KC Seow EA Fitzgerald DMY Lai 2006 Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix Nanotechnology 17 1964 1968 10.1088/0957-4484/17/8/028 10.1088/0957-4484/17/8/ 028 1:CAS:528:DC%2BD28XlvVyisbc%3D
    • (2006) Nanotechnology , vol.17 , pp. 1964-1968
    • Chew, H.G.1    Choi, W.K.2    Foo, Y.L.3    Zheng, F.4    Chim, W.K.5    Voon, Z.J.6    Seow, K.C.7    Fitzgerald, E.A.8    Lai, D.M.Y.9
  • 7
    • 33947497528 scopus 로고    scopus 로고
    • Influence of reductant and germanium concentration on the growth and stress development of germanium nanocrystals in silicon oxide matrix
    • 10.1088/0957-4484/18/6/065302 10.1088/0957-4484/18/6/065302
    • HG Chew F Zheng WK Choi WK Chim YL Foo EA Fitzgerald 2007 Influence of reductant and germanium concentration on the growth and stress development of germanium nanocrystals in silicon oxide matrix Nanotechnology 18 065302 10.1088/0957-4484/18/6/065302 10.1088/0957-4484/18/6/065302
    • (2007) Nanotechnology , vol.18 , pp. 065302
    • Chew, H.G.1    Zheng, F.2    Choi, W.K.3    Chim, W.K.4    Foo, Y.L.5    Fitzgerald, E.A.6
  • 8
    • 0001133378 scopus 로고    scopus 로고
    • Raman characterization of germanium nanocrystals in amorphous silicon oxide films synthesized by rapid thermal annealing
    • 10.1063/1.370901 10.1063/1.370901 1:CAS:528:DyaK1MXksVCjsbg%3D
    • WK Choi V Ng SP Ng HH Thio ZX Shen WS Li 1999 Raman characterization of germanium nanocrystals in amorphous silicon oxide films synthesized by rapid thermal annealing J Appl Phys 86 1398 1403 10.1063/1.370901 10.1063/1.370901 1:CAS:528:DyaK1MXksVCjsbg%3D
    • (1999) J Appl Phys , vol.86 , pp. 1398-1403
    • Choi, W.K.1    Ng, V.2    Ng, S.P.3    Thio, H.H.4    Shen, Z.X.5    Li, W.S.6
  • 9
    • 0001752782 scopus 로고    scopus 로고
    • Microstructural and photoluminescence studies of germanium nanocrystals in amorphous silicon oxide films
    • 10.1063/1.1342026 10.1063/1.1342026 1:CAS:528:DC%2BD3MXotlyjtg%3D%3D
    • WK Choi YW Ho SP Ng V Ng 2001 Microstructural and photoluminescence studies of germanium nanocrystals in amorphous silicon oxide films J Appl Phys 89 2168 2172 10.1063/1.1342026 10.1063/1.1342026 1:CAS:528: DC%2BD3MXotlyjtg%3D%3D
    • (2001) J Appl Phys , vol.89 , pp. 2168-2172
    • Choi, W.K.1    Ho, Y.W.2    Ng, S.P.3    Ng, V.4
  • 10
    • 31744433764 scopus 로고    scopus 로고
    • Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealing
    • 10.1016/j.jcrysgro.2005.12.033 10.1016/j.jcrysgro.2005.12.033 1:CAS:528:DC%2BD28XhtFShtbk%3D
    • WK Choi HG Chew V Hob V Ng WK Chim YW Ho SP Ng 2006 Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealing J Cryst Growth 288 79 83 10.1016/j.jcrysgro.2005.12.033 10.1016/j.jcrysgro.2005.12.033 1:CAS:528:DC%2BD28XhtFShtbk%3D
    • (2006) J Cryst Growth , vol.288 , pp. 79-83
    • Choi, W.K.1    Chew, H.G.2    Hob, V.3    Ng, V.4    Chim, W.K.5    Ho, Y.W.6    Ng, S.P.7
  • 11
    • 33748694528 scopus 로고    scopus 로고
    • Stress development of germanium nanocrystals in silicon oxide matrix
    • 10.1063/1.2354012 10.1063/1.2354012
    • WK Choi HG Chew F Zheng WK Chim YL Foo EA Fitzgerald 2006 Stress development of germanium nanocrystals in silicon oxide matrix Appl Phys Lett 89 113126 10.1063/1.2354012 10.1063/1.2354012
    • (2006) Appl Phys Lett , vol.89 , pp. 113126
    • Choi, W.K.1    Chew, H.G.2    Zheng, F.3    Chim, W.K.4    Foo, Y.L.5    Fitzgerald, E.A.6
  • 13
    • 70350615907 scopus 로고    scopus 로고
    • Pressure-induced phase transitions in amorphous and metastable crystalline germanium by Raman scattering X-ray spectroscopy, and ab initio calculations
    • 10.1103/PhysRevB.80.115213 10.1103/PhysRevB.80.115213
    • F Coppari JC Chervin A Congeduti M Lazzeri A Polian E Principi A Di Cicco 2009 Pressure-induced phase transitions in amorphous and metastable crystalline germanium by Raman scattering X-ray spectroscopy, and ab initio calculations Phys Rev B 80 115213 10.1103/PhysRevB.80.115213 10.1103/PhysRevB.80.115213
    • (2009) Phys Rev B , vol.80 , pp. 115213
    • Coppari, F.1    Chervin, J.C.2    Congeduti, A.3    Lazzeri, M.4    Polian, A.5    Principi, E.6    Di Cicco, A.7
  • 15
    • 84255204794 scopus 로고    scopus 로고
    • The role of the surfaces in the photon absorption in Ge nanoclusters embedded in silica
    • doi: 10.1186/1556-276X-6-135
    • Cosentino S, Mirabella S, Miritello M, Nicotra G, Lo Savio R (2011b) The role of the surfaces in the photon absorption in Ge nanoclusters embedded in silica. Nanoscale Res Lett 6:135. doi: 10.1186/1556-276X-6-135
    • (2011) Nanoscale Res Lett , vol.6 , pp. 135
    • Cosentino, S.1    Mirabella, S.2    Miritello, M.3    Nicotra, G.4    Lo Savio, R.5
  • 16
    • 0016335733 scopus 로고
    • Hopping conduction in amorphous germanium
    • 10.1063/1.2945979 1:CAS:528:DyaE2MXisVyhsQ%3D%3D
    • PJ Elliott AD Yoffe EA Davis 1974 Hopping conduction in amorphous germanium AIP Conf Proc 20 311 319 10.1063/1.2945979 1:CAS:528: DyaE2MXisVyhsQ%3D%3D
    • (1974) AIP Conf Proc , vol.20 , pp. 311-319
    • Elliott, P.J.1    Yoffe, A.D.2    Davis, E.A.3
  • 17
    • 0001509869 scopus 로고    scopus 로고
    • 2 films containing C, Si, and Ge clusters
    • 10.1063/1.115994 10.1063/1.115994 1:CAS:528:DyaK28XjvVGltbk%3D
    • 2 films containing C, Si, and Ge clusters Appl Phys Lett 68 3749 3751 10.1063/1.115994 10.1063/1.115994 1:CAS:528:DyaK28XjvVGltbk%3D
    • (1996) Appl Phys Lett , vol.68 , pp. 3749-3751
    • Fujii, M.1    Inoue, Y.2    Shinji, H.3    Yamamoto, K.4
  • 18
    • 0001694953 scopus 로고    scopus 로고
    • 2 films containing Ge nanocrystals
    • 10.1063/1.366858 10.1063/1.366858 1:CAS:528:DyaK1cXks1OgsA%3D%3D
    • 2 films containing Ge nanocrystals J Appl Phys 83 1507 1512 10.1063/1.366858 10.1063/1.366858 1:CAS:528:DyaK1cXks1OgsA%3D%3D
    • (1998) J Appl Phys , vol.83 , pp. 1507-1512
    • Fujii, M.1    Mamezaki, O.2    Hayashi, S.3    Yamamoto, K.4
  • 19
    • 58149263374 scopus 로고    scopus 로고
    • Fabrication of multilayered Ge nanocrystals by magnetron sputtering and annealing
    • 10.1088/0957-4484/19/45/455611 10.1088/0957-4484/19/45/455611
    • F Gao MA Green G Conibeer EC Cho Y Huang I Pere-Wurfl C Flynn 2008 Fabrication of multilayered Ge nanocrystals by magnetron sputtering and annealing Nanotechnology 19 455611 10.1088/0957-4484/19/45/455611 10.1088/0957-4484/19/45/455611
    • (2008) Nanotechnology , vol.19 , pp. 455611
    • Gao, F.1    Green, M.A.2    Conibeer, G.3    Cho, E.C.4    Huang, Y.5    Pere-Wurfl, I.6    Flynn, C.7
  • 20
    • 0035262950 scopus 로고    scopus 로고
    • Hopping model for charge transport in amorphous carbon
    • 10.1080/13642810108216536 10.1080/13642810010008402 1:CAS:528: DC%2BD3MXhsFelsL4%3D
    • C Godet 2001 Hopping model for charge transport in amorphous carbon Philos Mag B 81 205 222 10.1080/13642810108216536 10.1080/13642810010008402 1:CAS:528:DC%2BD3MXhsFelsL4%3D
    • (2001) Philos Mag B , vol.81 , pp. 205-222
    • Godet, C.1
  • 21
    • 1842631853 scopus 로고    scopus 로고
    • Conduction mechanisms in silicon-based nano composites
    • 1:CAS:528:DC%2BD2cXjtF2jsb8%3D
    • V Iancu M Draghici L Jdira ML Ciurea 2004 Conduction mechanisms in silicon-based nano composites J Optoelectron Adv Mater 6 53 56 1:CAS:528:DC%2BD2cXjtF2jsb8%3D
    • (2004) J Optoelectron Adv Mater , vol.6 , pp. 53-56
    • Iancu, V.1    Draghici, M.2    Jdira, L.3    Ciurea, M.L.4
  • 22
    • 0032120974 scopus 로고    scopus 로고
    • Single electron tunneling through Ge nanocrystal fabricated by cosputtering method
    • 10.1016/S0038-1101(98)00079-3 10.1016/S0038-1101(98)00079-3 1:CAS:528:DyaK1cXkvVOgs7c%3D
    • Y Inoue M Fujii S Hayashi K Yamamoto 1998 Single electron tunneling through Ge nanocrystal fabricated by cosputtering method Solid-State Electron 42 1605 1608 10.1016/S0038-1101(98)00079-3 10.1016/S0038-1101(98)00079-3 1:CAS:528:DyaK1cXkvVOgs7c%3D
    • (1998) Solid-State Electron , vol.42 , pp. 1605-1608
    • Inoue, Y.1    Fujii, M.2    Hayashi, S.3    Yamamoto, K.4
  • 24
    • 79951828814 scopus 로고    scopus 로고
    • Phonon confinement in Ge nanocrystals in silicon oxide matrix
    • 10.1063/1.3503444 10.1063/1.3503444
    • Y Jie ATS Wee CHA Huan ZX Shen WK Choi 2011 Phonon confinement in Ge nanocrystals in silicon oxide matrix J Appl Phys 109 033107 10.1063/1.3503444 10.1063/1.3503444
    • (2011) J Appl Phys , vol.109 , pp. 033107
    • Jie, Y.1    Wee, A.T.S.2    Huan, C.H.A.3    Shen, Z.X.4    Choi, W.K.5
  • 25
    • 0038302264 scopus 로고    scopus 로고
    • 2 matrix: Transmission electron microscopy, X-ray absorption, and optical studies
    • 10.1103/PhysRevB.67.195314 10.1103/PhysRevB.67.195314
    • 2 matrix: transmission electron microscopy, X-ray absorption, and optical studies Phys Rev B 67 195314 10.1103/PhysRevB.67.195314 10.1103/PhysRevB.67.195314
    • (2003) Phys Rev B , vol.67 , pp. 195314
    • Kolobov, A.V.1    Wei, S.Q.2    Yan, W.S.3    Oyanagi, H.4    Maeda, Y.5    Tanaka, K.6
  • 27
    • 2442532589 scopus 로고    scopus 로고
    • 2 multi layers
    • 10.1016/j.ssc.2004.04.026 10.1016/j.ssc.2004.04.026 1:CAS:528: DC%2BD2cXktF2gurk%3D
    • 2 multi layers Solid State Commun 131 21 25 10.1016/j.ssc.2004.04.026 10.1016/j.ssc.2004.04.026 1:CAS:528:DC%2BD2cXktF2gurk%3D
    • (2004) Solid State Commun , vol.131 , pp. 21-25
    • Li, J.1    Wu, X.L.2    Hu, D.S.3    Yang, Y.M.4    Qiu, T.5    Shen, J.C.6
  • 28
    • 0015614466 scopus 로고
    • Hall effects and noise measurement in epitaxial, polycrystalline, and amorphous Ge
    • 10.1002/pssa.2210160206 10.1002/pssa.2210160206 1:CAS:528: DyaE3sXhs1Glu7o%3D
    • RA Lomas MJ Hampshire RD Tomlinson KF Knott 1973 Hall effects and noise measurement in epitaxial, polycrystalline, and amorphous Ge Phys Stat Sol (a) 16 385 394 10.1002/pssa.2210160206 10.1002/pssa.2210160206 1:CAS:528: DyaE3sXhs1Glu7o%3D
    • (1973) Phys Stat Sol (A) , vol.16 , pp. 385-394
    • Lomas, R.A.1    Hampshire, M.J.2    Tomlinson, R.D.3    Knott, K.F.4
  • 29
    • 35949006801 scopus 로고
    • 2 matrix: Evidence in support of the quantum-confinement mechanism
    • 10.1103/PhysRevB.51.1658 10.1103/PhysRevB.51.1658 1:CAS:528: DyaK2MXjt1ekt7w%3D
    • 2 matrix: evidence in support of the quantum-confinement mechanism Phys Rev B 51 1658 1670 10.1103/PhysRevB.51.1658 10.1103/PhysRevB.51.1658 1:CAS:528:DyaK2MXjt1ekt7w%3D
    • (1995) Phys Rev B , vol.51 , pp. 1658-1670
    • Maeda, Y.1
  • 30
    • 84996228926 scopus 로고
    • Conduction in non-crystalline materials. III. Localized states in pseudogap and near extremities of conduction and valence bands
    • doi: 10.1080/14786436908216338
    • Mott NF (1969) Conduction in non-crystalline materials. III. Localized states in pseudogap and near extremities of conduction and valence bands. Philos Mag 19:835-852. doi: 10.1080/14786436908216338
    • (1969) Philos Mag , vol.19 , pp. 835-852
    • Mott, N.F.1
  • 31
    • 77956849422 scopus 로고    scopus 로고
    • Effects influencing electron and hole retention times in Ge nanocrystal memory structures operating in the direct tunneling regime
    • 10.1063/1.3467527 10.1063/1.3467527
    • R Peibst M Erenburg E Bugiel KR Hofmann 2010 Effects influencing electron and hole retention times in Ge nanocrystal memory structures operating in the direct tunneling regime J Appl Phys 108 054316 10.1063/1.3467527 10.1063/1.3467527
    • (2010) J Appl Phys , vol.108 , pp. 054316
    • Peibst, R.1    Erenburg, M.2    Bugiel, E.3    Hofmann, K.R.4
  • 33
    • 4244096206 scopus 로고
    • DC conductivity of amorphous germanium and the structure of the pseudogap
    • 10.1103/PhysRevLett.30.856 10.1103/PhysRevLett.30.856 1:CAS:528:DyaE3sXhs1Gksb0%3D
    • M Pollak ML Knotek H Kurtzman H Glick 1973 DC conductivity of amorphous germanium and the structure of the pseudogap Phys Rev Lett 30 856 859 10.1103/PhysRevLett.30.856 10.1103/PhysRevLett.30.856 1:CAS:528: DyaE3sXhs1Gksb0%3D
    • (1973) Phys Rev Lett , vol.30 , pp. 856-859
    • Pollak, M.1    Knotek, M.L.2    Kurtzman, H.3    Glick, H.4
  • 34
    • 13444261162 scopus 로고    scopus 로고
    • 2 matrix
    • 10.1016/j.optmat.2004.08.041 10.1016/j.optmat.2004.08.041 1:CAS:528:DC%2BD2MXhtFGnsL8%3D
    • 2 matrix Opt Mater 27 948 952 10.1016/j.optmat.2004. 08.041 10.1016/j.optmat.2004.08.041 1:CAS:528:DC%2BD2MXhtFGnsL8%3D
    • (2005) Opt Mater , vol.27 , pp. 948-952
    • Ray, S.K.1    Das, K.2
  • 35
    • 0037194340 scopus 로고    scopus 로고
    • 2 co-sputtered films
    • 10.1016/S0375-9601(02)00617-5 10.1016/S0375-9601(02)00617-5 1:CAS:528:DC%2BD38Xls1WntLo%3D
    • 2 co-sputtered films Phys Lett A 300 307 310 10.1016/S0375-9601(02)00617-5 10.1016/S0375-9601(02)00617-5 1:CAS:528:DC%2BD38Xls1WntLo%3D
    • (2002) Phys Lett A , vol.300 , pp. 307-310
    • Shen, J.K.1    Wu, X.L.2    Tan, C.3    Yuan, R.K.4    Bao, X.M.5
  • 36
    • 79953061384 scopus 로고    scopus 로고
    • Growth and characterization of nc-Ge prepared by microwave annealing
    • 10.1016/j.vacuum.2011.01.012 10.1016/j.vacuum.2011.01.012 1:CAS:528:DC%2BC3MXjvVKhtL0%3D
    • N Srinivasa Rao AP Pathak G Devaraju V Saikiran 2011 Growth and characterization of nc-Ge prepared by microwave annealing Vacuum 85 927 931 10.1016/j.vacuum.2011.01.012 10.1016/j.vacuum.2011.01.012 1:CAS:528: DC%2BC3MXjvVKhtL0%3D
    • (2011) Vacuum , vol.85 , pp. 927-931
    • Srinivasa Rao, N.1    Pathak, A.P.2    Devaraju, G.3    Saikiran, V.4
  • 38
    • 0000796126 scopus 로고    scopus 로고
    • 2 matrices
    • 10.1103/PhysRevB.58.7921 10.1103/PhysRevB.58.7921 1:CAS:528: DyaK1cXmtVCnsbs%3D
    • 2 matrices Phys Rev B 58 7921 7925 10.1103/PhysRevB.58.7921 10.1103/PhysRevB.58.7921 1:CAS:528:DyaK1cXmtVCnsbs%3D
    • (1998) Phys Rev B , vol.58 , pp. 7921-7925
    • Takeoka, S.1    Fujii, M.2    Hayashi, S.3    Yamamoto, K.4
  • 40
    • 44949252991 scopus 로고    scopus 로고
    • Enhanced 400-600 nm photo responsivity of metal-oxide-semiconductor diodes with multi-stack germanium quantum dots
    • 10.1088/0957-4484/19/23/235203
    • SS Tzeng PW Li 2008 Enhanced 400-600 nm photo responsivity of metal-oxide-semiconductor diodes with multi-stack germanium quantum dots Nanotechnology 19 2352 1 6 10.1088/0957-4484/19/23/235203
    • (2008) Nanotechnology , vol.19 , Issue.2352 , pp. 1-6
    • Tzeng, S.S.1    Li, P.W.2
  • 41
    • 77954336218 scopus 로고    scopus 로고
    • 2 at temperatures below 400 °c using magnetron sputtering
    • 10.1063/1.3457864 10.1063/1.3457864
    • 2 at temperatures below 400°C using magnetron sputtering Appl Phys Lett 96 261901 10.1063/1.3457864 10.1063/1.3457864
    • (2010) Appl Phys Lett , vol.96 , pp. 261901
    • Zhang, B.1    Shrestha, S.2    Green, M.A.3    Conibeer, G.4
  • 43
    • 79951835642 scopus 로고    scopus 로고
    • Electrical properties of conductive Ge nanocrystal thin films fabricated by low temperature in situ growth
    • 10.1088/0957-4484/22/12/125204 10.1088/0957-4484/22/12/125204 1:STN:280:DC%2BC3M7pslKitg%3D%3D
    • B Zhang Y Yao R Patterson S Shrestha MA Green G Conibeer 2011 Electrical properties of conductive Ge nanocrystal thin films fabricated by low temperature in situ growth Nanotechnology 22 125204 10.1088/0957-4484/22/12/125204 10.1088/0957-4484/22/12/125204 1:STN:280:DC%2BC3M7pslKitg%3D%3D
    • (2011) Nanotechnology , vol.22 , pp. 125204
    • Zhang, B.1    Yao, Y.2    Patterson, R.3    Shrestha, S.4    Green, M.A.5    Conibeer, G.6
  • 46
    • 53549110006 scopus 로고    scopus 로고
    • Stress tuning of Ge nanocrystals embedded in dielectrics
    • 10.1021/jp801529j 10.1021/jp801529j 1:CAS:528:DC%2BD1cXmsVKhurs%3D
    • F Zheng WK Choi F Lin S Tripathy JX Zhang 2008 Stress tuning of Ge nanocrystals embedded in dielectrics J Phys Chem C 112 9223 9228 10.1021/jp801529j 10.1021/jp801529j 1:CAS:528:DC%2BD1cXmsVKhurs%3D
    • (2008) J Phys Chem C , vol.112 , pp. 9223-9228
    • Zheng, F.1    Choi, W.K.2    Lin, F.3    Tripathy, S.4    Zhang, J.X.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.