Structural investigations of Ge nanoparticles embedded in an amorphous SiO2 matrix

Journal of Nanoparticle Research

Volumn 13, Issue 1, 2011, Pages 221-232

  Stavarache, Ionel ^a   Lepadatu, Ana Maria ^a   Gheorghe, Nicoleta G ^a   Costescu, Ruxandra M ^a   Stan, George E ^a   Marcov, Dan ^a   Slav, Adrian ^a   Iordache, Gheorghe ^a   Stoica, Tionica F ^a   Iancu, Vladimir ^b   Teodorescu, Valentin S ^a   Teodorescu, Cristian M ^a   Ciurea, Magdalena Lidia ^a  

^a NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^b UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

Author keywords

Composite nanomaterials; Magnetron sputtering; Nanoparticles; Sol gel; TEM; XPS

Indexed keywords

CRYSTALLINE GE; FILM SURFACES; GE CONCENTRATIONS; GE NANOPARTICLES; GE-SEGREGATION; HIGH PRESSURE; MATRIX; NANO-MATERIALS; RADIO FREQUENCY MAGNETRON SPUTTERING; SOLGEL FILMS; SPUTTERED FILMS; STRUCTURAL INVESTIGATION; TEM; TETRAGONAL PHASE; XPS;

GELS; GERMANIUM; INTERNET PROTOCOLS; MAGNETRON SPUTTERING; METALLIC FILMS; NANOPARTICLES; NANOSTRUCTURED MATERIALS; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

GERMANIUM; NANOPARTICLE; SILICON DIOXIDE;

ANALYTIC METHOD; ARTICLE; CHEMICAL STRUCTURE; EMBEDDING; PRIORITY JOURNAL; SURFACE PROPERTY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79551612364     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-010-0021-4     Document Type: Article

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