The role of the surfaces in the photon absorption in ge nanoclusters embedded in silica

Nanoscale Research Letters

Volumn 6, Issue 1, 2011, Pages

  Cosentino, Salvatore ^a   Mirabella, Salvatore ^a   Miritello, Maria ^a   Nicotra, Giuseppe ^b   Lo Savio, Roberto ^a   Simone, Francesca ^a   Spinella, Corrado ^b   Terrasi, Antonio ^a  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSION EFFICIENCY; CRYSTALLINE MATERIALS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LIGHT ABSORPTION; NANOCLUSTERS; PHOTONS; QUANTUM EFFICIENCY; SILICA; GERMANIUM; OSTWALD RIPENING; PHOTOVOLTAIC EFFECTS; SEMICONDUCTOR QUANTUM DOTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CRYSTALLINE TRANSITION; MAGNETRON-SPUTTERING DEPOSITION; OSTWALD RIPENING MECHANISM; PHOTON ABSORPTIONS; QUANTUM CONFINEMENT EFFECTS; SEMICONDUCTOR NANOSTRUCTURES; THERMAL EVOLUTION; X-RAY DIFFRACTION TECHNIQUES; GE NANOSTRUCTURES; GE QUANTUM DOT; NANO SCALE; PHOTOVOLTAICS; SILICA MATRIX; SIMPLE MODELING; SOLID-PHASE; THIRD GENERATION; UNDERLYING MECHANISM;

SEMICONDUCTOR QUANTUM DOTS; QUANTUM EFFICIENCY;

EID: 84255204794     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-135     Document Type: Article

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