Thickness-dependence of optical constants for Ta 2O 5 ultrathin films

Applied Physics A: Materials Science and Processing

Volumn 108, Issue 4, 2012, Pages 975-979

  Zhang, Dong Xu ^a   Zheng, Yu Xiang ^a   Cai, Qing Yuan ^a   Lin, Wei ^a   Wu, Kang Ning ^a   Mao, Peng Hui ^a   Zhang, Rong Jun ^a   Zhao, Hai Bin ^a   Chen, Liang Yao ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL SILICON; ELECTRON BEAM EVAPORATION; INTERFACIAL OXIDES;

ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; OPTICAL CONSTANTS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS; TANTALUM OXIDES; THIN FILM DEVICES;

ULTRATHIN FILMS;

EID: 84865229000     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-012-7007-2     Document Type: Article

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