Evolution of optical constants of silicon dioxide on silicon from ultrathin films to thick films

Journal of Physics D: Applied Physics

Volumn 43, Issue 44, 2010, Pages

  Cai, Qing Yuan ^a   Zheng, Yu Xiang ^a   Mao, Peng Hui ^a   Zhang, Rong Jun ^a   Zhang, Dong Xu ^a   Liu, Ming Hui ^a   Chen, Liang Yao ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE SPECTROSCOPIC ELLIPSOMETRY; CRYSTAL SILICON; ELECTRON BEAM EVAPORATION; FILM MODEL; SILICON DIOXIDE;

ELECTRON BEAMS; LIGHT REFRACTION; OPTICAL CONSTANTS; OXIDE FILMS; REFRACTIVE INDEX; REFRACTOMETERS; SILICA; SILICON OXIDES; SPECTROSCOPIC ELLIPSOMETRY; STOICHIOMETRY; SUBSTRATES; THICK FILMS; VAPOR DEPOSITION;

ULTRATHIN FILMS;

EID: 78349240027     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/44/445302     Document Type: Article

References (25)

1. Green M L, Gusev E P, Degraeve R and Garfunkel E L 2001 J. Appl. Phys. 90 2057
2. Prasad P N 2004 Nanophotonics (New York: Wiley-Interscience)
3. Mutti P, Ghislotti G, Bertoni S, Bonoldi L, Cerofolini G F, Meda L, Grilli E and Guzzi M 1995 Appl. Phys. Lett. 66 851
4. Pivac B, Dubček P, Capan I, Zorc H, Bernstorff S, Duguay S and Slaoui A 2008 Thin Solid Films 516 6796-9
5. O'Sullivan F, Celanovic I, Jovanovic N, Kassakian J, Akiyama S and Wada K 2005 J. Appl. Phys. 97 033529
6. Moreno J A, Garrido B, Pellegrino P, Garcia C, Arbiol J, Morante J R, Marie P, Gourbilleau F and Rizk R 2005 J. Appl. Phys. 98 013523
7. Yoo H G and Fauchet P M 2008 Phys. Rev. B 77 115355
8. Hebert K J, Zafar S, Irene E A, Kuehn R, McCarthy T E and Demirlioglu E K 1996 Appl. Phys. Lett. 68 266
9. Furukawa K, Liu Y, Nakashima H, Gao D, Kashiwazaki Y, Uchino K, Muraoka K and Tsuzuki H 1998 J. Appl. Phys. 84 4579
10. Frammelsberger W, Benstetter G, Schweinboeck T, Stamp R J and Kiely J 2003 Microelectron. Reliab. 43 1465-70
11. Cho Y J et al 1998 Thin Solid Films 313-314 292-7
12. Wang Y and Irene E A 2000 J. Vac. Sci. Technol. B 18 279-82
13. Kalnitsky A, Tay S P and Ellul J P 1990 J. Electrochem. Soc. 137 234-8
14. Ayupov B M, Gritsenko V A, Hei Wong and Kim C W 2006 J. Electrochem. Soc. 153 277-82
15. Azzam R M A and Bashara N M 1977 Ellipsometry and Polarized Light (Amsterdam: North-Holland)
16. Vedam K 1998 Thin Solid Films 313-314 1-9
17. Woollam J A, Snyder P G and Rost M C 1988 Thin Solid Films 166 317-23
18. Cho Y J, Lee Y W, Cho H M, Lee I W and Kim S Y 1999 J. Appl. Phys. 85 1114
19. Kern W and Poutinen D A 1970 RCA Rev. 31 187-206
20. Chen L Y and Lynch D W 1987 Appl. Opt. 26 5221-8
21. Chen L Y, Feng X W, Su Y, Ma H Z and Qian Y H 1994 Appl. Opt. 33 1299-305
22. Giustino F, Bongiorno A and Pasquarello A 2005 J. Phys.: Condens. Matter 17 S2065
23. Tomfohr J K and Sankey O F 2002 Phys. Status Solidi b 233 59
24. Bruggeman D A G 1935 Ann. Phys. 24 636-64
25. Massoud H Z and Przewlocki H M 2002 J. Appl. Phys. 92 2202-6