Nondestructive measurement of interfacial SiO2 films formed during deposition and annealing of Ta2O5

Applied Physics Letters

Volumn 68, Issue 14, 1996, Pages 1924-1926

  Devine, R A B ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000291382     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115627     Document Type: Article

References (9)

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